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Volumn 90, Issue 6, 2002, Pages 942-955

SiC materials - Progress, status, and potential roadblocks

Author keywords

Blue light emitting diodes (LEDs); High power switching; Hot wall epitaxy; Physical vapor transport; SiC substrates; Vapor phase epitaxy

Indexed keywords

EPITAXIAL GROWTH; GALLIUM NITRIDE; LIGHT EMITTING DIODES; MICROWAVE DEVICES; RESEARCH AND DEVELOPMENT MANAGEMENT; VAPOR PHASE EPITAXY;

EID: 10844255354     PISSN: 00189219     EISSN: None     Source Type: Journal    
DOI: 10.1109/JPROC.2002.1021560     Document Type: Article
Times cited : (193)

References (83)
  • 1
    • 0026158174 scopus 로고
    • Thin film deposition and microelectronic and optoelectonic device fabrication and characterization in monocrystalline alpha and beta silicon carbide
    • May
    • R. F. Davis, G. Kelner, M. Shur, J. W. Palmour, and J. A. Edmond, "Thin film deposition and microelectronic and optoelectonic device fabrication and characterization in monocrystalline alpha and beta Silicon carbide," Proc. IEEE, vol. 79, pp. 677-701, May 1991.
    • (1991) Proc. IEEE , vol.79 , pp. 677-701
    • Davis, R.F.1    Kelner, G.2    Shur, M.3    Palmour, J.W.4    Edmond, J.A.5
  • 2
    • 0025387629 scopus 로고
    • Toward a unified view of polytypism in silicon carbide
    • Feb.
    • G. R. Fisher and P. Barnes, 'Toward a unified view of polytypism in silicon carbide," Phil. Mag. B, vol. 61, no. 2, pp. 217-236, Feb. 1990.
    • (1990) Phil. Mag. B , vol.61 , Issue.2 , pp. 217-236
    • Fisher, G.R.1    Barnes, P.2
  • 4
    • 0002525621 scopus 로고
    • Controlled sublimation growth of single crystalline 4H SiC and 6H SiC and identification of poly types by X-ray diffraction
    • Jan.
    • M. Kanaya, J. Takhashi, Y. Fujiwara, and A. Moritani, "Controlled sublimation growth of single crystalline 4H SiC and 6H SiC and identification of poly types by X-ray diffraction," Appl. Phys. Lett., vol. 58, p. 56, Jan. 1991.
    • (1991) Appl. Phys. Lett. , vol.58 , pp. 56
    • Kanaya, M.1    Takhashi, J.2    Fujiwara, Y.3    Moritani, A.4
  • 5
    • 0041105175 scopus 로고    scopus 로고
    • Physical vapor transport growth and properties of SiC monocrystals of 4H polytype
    • July
    • G. Augustine, et al., "Physical vapor transport growth and properties of SiC monocrystals of 4H polytype," Phys. Slat. Sol. (b), vol. 202, no. 1, p. 137, July 1997.
    • (1997) Phys. Slat. Sol. (b) , vol.202 , Issue.1 , pp. 137
    • Augustine, G.1
  • 6
    • 0027624068 scopus 로고
    • Control of polytype formation by surface energy effects during the growth of SiC monocrystals by the sublimation method
    • July
    • R. A. Stein and P. Lanig, "Control of polytype formation by surface energy effects during the growth of SiC monocrystals by the sublimation method," J. Cryst. Growth, vol. 131, no. 1, p. 71, July 1993.
    • (1993) J. Cryst. Growth , vol.131 , Issue.1 , pp. 71
    • Stein, R.A.1    Lanig, P.2
  • 7
    • 14344282423 scopus 로고    scopus 로고
    • Stability criteria for 4H-SiC bulk growth
    • Straubinger, et al., "Stability criteria for 4H-SiC bulk growth," Mater. Sci. Forum, vol. 353-356, p. 55, 2001.
    • (2001) Mater. Sci. Forum , vol.353-356 , pp. 55
    • Straubinger1
  • 8
    • 0031486893 scopus 로고    scopus 로고
    • Electronic band structure of SiC polytypes: A discussion of theory and experiment
    • July
    • W. R. L. Lambrecht, S. Limpijumnong, S. N. Rashkeev, and B. Segall, "Electronic band structure of SiC polytypes: A discussion of theory and experiment," Phys. Stat. Sol. (b), vol. 202, no. 1, p. 5, July 1997.
    • (1997) Phys. Stat. Sol. (b) , vol.202 , Issue.1 , pp. 5
    • Lambrecht, W.R.L.1    Limpijumnong, S.2    Rashkeev, S.N.3    Segall, B.4
  • 9
    • 33750282370 scopus 로고
    • Solubility of carbon in silicon and germanium
    • R. I. Scace and G. A. Slack, "Solubility of carbon in silicon and germanium," J. Chem. Phys., vol. 30, p. 1551, 1959.
    • (1959) J. Chem. Phys. , vol.30 , pp. 1551
    • Scace, R.I.1    Slack, G.A.2
  • 11
    • 0001093831 scopus 로고
    • Darstelling von einkristallen von silizum carbid und beherrschung von art und menge der eingebauten Verunreinigungen
    • J. A. Lely, "Darstelling von einkristallen von silizum carbid und beherrschung von art und menge der eingebauten Verunreinigungen" (in German), Ber. Dt. Keram. Ges., vol. 32, p. 299, 1955.
    • (1955) Ber. Dt. Keram. Ges. , vol.32 , pp. 299
    • Lely, J.A.1
  • 12
    • 33847510976 scopus 로고
    • Investigations and growth processes of ingots of silicon carbide single crystals
    • Y. M. Tariov and V. F. Tsvetkov, "Investigations and growth processes of ingots of silicon carbide single crystals," J. Cryst. Growth, vol. 43, pp. 209-212, 1978.
    • (1978) J. Cryst. Growth , vol.43 , pp. 209-212
    • Tariov, Y.M.1    Tsvetkov, V.F.2
  • 13
    • 0026747593 scopus 로고
    • Influence of surface-energy on the growth of 6H SiC and 4H SiC polytypes by sublimation
    • R. A. Stein et al., "Influence of surface-energy on the growth of 6H SiC and 4H SiC polytypes by sublimation," Mater. Sci. Eng. B, vol. 11, p. 69, 1992.
    • (1992) Mater. Sci. Eng. B , vol.11 , pp. 69
    • Stein, R.A.1
  • 14
    • 0027559510 scopus 로고
    • Growth of large SiC single crystals
    • Mar.
    • D. L. Barrett, et al., "Growth of large SiC single crystals," J. Cryst. Growth, vol. 128, no. 1, Mar. 1993.
    • (1993) J. Cryst. Growth , vol.128 , Issue.1
    • Barrett, D.L.1
  • 15
    • 12944270586 scopus 로고    scopus 로고
    • Status of large, diameter SiC crystal growth for electronic and optical applications
    • H. McD. Hobgood, et al., "Status of large, diameter SiC crystal growth for electronic and optical applications," Mater. Sci. Forum, vol. 338-342, p. 3, 2000.
    • (2000) Mater. Sci. Forum , vol.338-342 , pp. 3
    • Hobgood, H.McD.1
  • 16
    • 84984389487 scopus 로고
    • Investigation of nitrogen solubility processes in silicon carbide
    • S. K. Lilov, Yu. M. Tariov, and V. F. Tsvetkov, "Investigation of nitrogen solubility processes in Silicon carbide," Krist. Tech., vol. 14, no. 1, p. 111, 1979.
    • (1979) Krist. Tech. , vol.14 , Issue.1 , pp. 111
    • Lilov, S.K.1    Tariov, Yu.M.2    Tsvetkov, V.F.3
  • 17
    • 33646889460 scopus 로고    scopus 로고
    • The role of residual impurities in SiC grown by physical vapor transport
    • Bristol, U.K.: Inst. of Physics, Inst. of Physics Conference Series
    • R. C. Glass, et al., "The role of residual impurities in SiC grown by physical vapor transport," in Silicon Carbide and Related Materials, ser. 142. Bristol, U.K.: Inst. of Physics, 1996, Inst. of Physics Conference Series.
    • (1996) Silicon Carbide and Related Materials, Ser. 142
    • Glass, R.C.1
  • 18
    • 0000543896 scopus 로고
    • Phonon-electron scattering in single crystal silicon carbide
    • Dec.
    • D. T. Morelli, J. P. Heremans, C. P. Beetz, W. S. Yoo, and H. Matsunami, "Phonon-electron scattering in single crystal silicon carbide," Appl. Phys. Lett., vol. 63, no. 23, p. 3145, Dec. 1993.
    • (1993) Appl. Phys. Lett. , vol.63 , Issue.23 , pp. 3145
    • Morelli, D.T.1    Heremans, J.P.2    Beetz, C.P.3    Yoo, W.S.4    Matsunami, H.5
  • 19
    • 0037821169 scopus 로고
    • Nonmetallic crystals with high thermal conductivity
    • no. ?, MONTH
    • G. A. Slack and J. Phys. "Nonmetallic crystals with high thermal conductivity," Chem. Solids, vol. 34, no. ?, p. 321, MONTH? 1973.
    • (1973) Chem. Solids , vol.34 , pp. 321
    • Slack, G.A.1    Phys, J.2
  • 20
    • 0018516729 scopus 로고
    • Thermal conductivity and electrical properties of 6H silicon carbide
    • Sept.
    • L: A. Burgemeister, W. von Muench, and E. Pettenpaul, 'Thermal conductivity and electrical properties of 6H silicon carbide," J. Appl. Phys., vol. 50. no. 9, p. 5790, Sept. 1979.
    • (1979) J. Appl. Phys. , vol.50 , Issue.9 , pp. 5790
    • Burgemeister, L.A.1    Von Muench, W.2    Pettenpaul, E.3
  • 21
    • 0000433335 scopus 로고
    • Capillary equilibrium of dislocated crystals
    • no. ?, MONTH
    • F. C. Frank, "Capillary equilibrium of dislocated crystals," Acta Cryst., vol. 4, no. ?, p. 497, MONTH? 1950.
    • (1950) Acta Cryst. , vol.4 , pp. 497
    • Frank, F.C.1
  • 23
    • 0031648293 scopus 로고    scopus 로고
    • Experimental studies of hollow-core screw dislocations in 6H-SiC and 4H-SiC single crystals
    • W. Si, M. Dudley, and R. Glass et al., "Experimental studies of hollow-core screw dislocations in 6H-SiC and 4H-SiC single crystals," Mater. Sci. Forum, pt. 1-2, vol. 264-2, pp. 429-432, 1998.
    • (1998) Mater. Sci. Forum, Pt. 1-2 , vol.264 , Issue.2 , pp. 429-432
    • Si, W.1    Dudley, M.2    Glass, R.3
  • 24
    • 0000176628 scopus 로고    scopus 로고
    • Superscrew dislocation contrast on synchrotron white-beam topographs: An accurate description of the direct dislocation image
    • July
    • X. R. Huang, M. Dudley, W. M. Vetter, W. Huang, W. Si, and C. H. Carter, Jr., "Superscrew dislocation contrast on synchrotron white-beam topographs: An accurate description of the direct dislocation image," J. Appl. Crystallogr., vol. 32, no. 3, p. 516, July 1999.
    • (1999) J. Appl. Crystallogr. , vol.32 , Issue.3 , pp. 516
    • Huang, X.R.1    Dudley, M.2    Vetter, W.M.3    Huang, W.4    Si, W.5    Carter Jr., C.H.6
  • 25
    • 0034256173 scopus 로고    scopus 로고
    • Micropipe's in silicon carbide crystals: Do all screw dislocations have open cores?
    • Aug.
    • W. M. Vetter and M. Dudley, "Micropipe's in silicon carbide crystals: Do all screw dislocations have open cores?," J. Mater. Res., vol. 15, no. 8, p. 1649, Aug. 2000.
    • (2000) J. Mater. Res. , vol.15 , Issue.8 , pp. 1649
    • Vetter, W.M.1    Dudley, M.2
  • 26
    • 84858896407 scopus 로고
    • "Method of preparing silicon carbide surfaces for crystal growth," U.S. Patent 4 946 547
    • J. W. Palmour, H. Kong, and J. Edmond, "Method of preparing silicon carbide surfaces for crystal growth," U.S. Patent 4 946 547, 1990.
    • (1990)
    • Palmour, J.W.1    Kong, H.2    Edmond, J.3
  • 27
    • 0031170485 scopus 로고    scopus 로고
    • Chemomechanical polishing of silicon carbide
    • June
    • L. Zhou, V. Audurier, P. Pirouz, and J. A. Powell, J., "Chemomechanical polishing of silicon carbide," Etectrochem. Soc., vol. 144, no. 6, p. 161, June 1997.
    • (1997) Etectrochem. Soc. , vol.144 , Issue.6 , pp. 161
    • Zhou, L.1    Audurier, V.2    Pirouz, P.3    Powell, J.A.J.4
  • 28
    • 0014631702 scopus 로고
    • Formation of epitaxial β-SiC films on sapphire
    • I. H. Khan and A. J. Learn, "Formation of epitaxial β-SiC films on sapphire," Appl. Phys. Lett., vol. 15, pp. 410-414, 1969.
    • (1969) Appl. Phys. Lett. , vol.15 , pp. 410-414
    • Khan, I.H.1    Learn, A.J.2
  • 29
    • 36448999678 scopus 로고
    • Epitaxial growth of β-SiC on silicon-on-sapphire substrates by chemical vapor deposition
    • Apr.
    • J. C. Pazik, G. Kelner, and N. Bottka, "Epitaxial growth of β-SiC on silicon-on-sapphire substrates by chemical vapor deposition," Appl. Phys. Lett., vol. 58. no. 13, pp. 1419-1422, Apr. 1991.
    • (1991) Appl. Phys. Lett. , vol.58 , Issue.13 , pp. 1419-1422
    • Pazik, J.C.1    Kelner, G.2    Bottka, N.3
  • 30
    • 33646874739 scopus 로고
    • Epitaxial growth of SiC on AlN substrates
    • R. C. Marshall, J. W. Faust, Jr., and C. E. Ryan, Eds. Columbia, SC: Univ. of South Carolina Press
    • R. F. Rutz and J. J. Cuomo, "Epitaxial growth of SiC on AlN substrates," in Silicon Carbide 1973, R. C. Marshall, J. W. Faust, Jr., and C. E. Ryan, Eds. Columbia, SC: Univ. of South Carolina Press, 1974, pp. 72-79.
    • (1974) Silicon Carbide 1973 , pp. 72-79
    • Rutz, R.F.1    Cuomo, J.J.2
  • 31
    • 85033172093 scopus 로고
    • Crystal growth of SiC on AlN/sapphire by CVD method
    • Bristol, U.K.: Inst. of Physics, Inst. of Physics Conference Series
    • S. Nishino, K. Takahashi, H. Tanaka, and J. Saraie, "Crystal growth of SiC on AlN/sapphire by CVD method," in Silicon Carbide and Related Materials, ser. 137. Bristol, U.K.: Inst. of Physics, 1994, Inst. of Physics Conference Series, pp. 63-66.
    • (1994) Silicon Carbide and Related Materials, Ser. 137 , pp. 63-66
    • Nishino, S.1    Takahashi, K.2    Tanaka, H.3    Saraie, J.4
  • 32
    • 0004145126 scopus 로고
    • Heteroepitaxial growth of SiC on AlN by chemical vapor deposition
    • Bristol, U.K.: Inst. of Physics, Inst. of Physics Conference Series
    • V. A. Dmitriev, K. G. Irvine, M. G. Spencer, and I. P. Nikitina, "Heteroepitaxial growth of SiC on AlN by chemical vapor deposition," in Silicon Carbide and Related Materials, ser. 137. Bristol, U.K.: Inst. of Physics, 1994, Inst. of Physics Conference Series, pp. 67-70.
    • (1994) Silicon Carbide and Related Materials, Ser. 137 , pp. 67-70
    • Dmitriev, V.A.1    Irvine, K.G.2    Spencer, M.G.3    Nikitina, I.P.4
  • 33
    • 0037713441 scopus 로고
    • β-SiC on titanium carbide for solid state devices
    • M. M. Rahman, C. Y. W. Yang, and G.L. Harris, Eds. Berlin, Germany:Springer-Verlag
    • J. D. Parsons, G. B. Kruaval, and J. A. Vigil, "β-SiC on titanium carbide for solid state devices," in Amorphous and Crystalline Silicon Carbide and Related Materials II, M. M. Rahman, C. Y. W. Yang, and G.L. Harris, Eds. Berlin, Germany:Springer-Verlag, 1989, pp. 171-177.
    • (1989) Amorphous and Crystalline Silicon Carbide and Related Materials II , pp. 171-177
    • Parsons, J.D.1    Kruaval, G.B.2    Vigil, J.A.3
  • 34
    • 0028480364 scopus 로고
    • Heteroepitaxial growth of β-SiC films on TiC substrates: Interface structures and defects
    • Aug.
    • F. R. Chien, S. R. Nutt, J. M. Carulli, Jr., N. Buchan, C. P. Beetz, Jr., and W. S. Yoo, "Heteroepitaxial growth of β-SiC films on TiC substrates: Interface structures and defects," J. Mater. Res., vol. 9, no. 8, pp. 2086-2095, Aug. 1994.
    • (1994) J. Mater. Res. , vol.9 , Issue.8 , pp. 2086-2095
    • Chien, F.R.1    Nutt, S.R.2    Carulli Jr., J.M.3    Buchan, N.4    Beetz Jr., C.P.5    Yoo, W.S.6
  • 35
    • 0040788059 scopus 로고
    • Epitaxial growth of SiC film on silicon substrate and its crystal structure
    • no. ?, MONTH
    • H. Nakashima, T. Sugano, and H. Yanai, "Epitaxial growth of SiC film on silicon substrate and its crystal structure," Jpn. J. Appl. Phys., vol. 5. no. ?, pp. 874-878, MONTH? 1966.
    • (1966) Jpn. J. Appl. Phys. , vol.5 , pp. 874-878
    • Nakashima, H.1    Sugano, T.2    Yanai, H.3
  • 36
    • 0024303028 scopus 로고
    • Growth rate, surface morphology, and defect microstructures of β-SiC films chemically vapor deposited on 6H-SiC substrates
    • Jan.
    • H. S. Kong, J. T. Glass, and R. F. Davis, "Growth rate, surface morphology, and defect microstructures of β-SiC films chemically vapor deposited on 6H-SiC substrates," J. Mater. Res., vol. 4, no. 1, pp. 204-214, Jan. 1989.
    • (1989) J. Mater. Res. , vol.4 , Issue.1 , pp. 204-214
    • Kong, H.S.1    Glass, J.T.2    Davis, R.F.3
  • 37
    • 0024055553 scopus 로고
    • Critical evaluation of the status of the areas for future research regarding the wide bandgap semiconductors of diamond, gallium nitride, and silicon carbide
    • R. F. Davis, et al., "Critical evaluation of the status of the areas for future research regarding the wide bandgap semiconductors of diamond, gallium nitride, and silicon carbide," Mater. Sci. Eng., vol. B1, pp. 77-104, 1988.
    • (1988) Mater. Sci. Eng. , vol.B1 , pp. 77-104
    • Davis, R.F.1
  • 38
    • 0005934066 scopus 로고
    • Chemical vapor deposition of silicon carbide
    • G. L. Harris, Ed. London, U.K.: INSPEC, EMIS Data Review
    • S. Nishino, "Chemical vapor deposition of silicon carbide," in Properties of Silicon Carbide, ser. 13, G. L. Harris, Ed. London, U.K.: INSPEC, 1995, EMIS Data Review, pp. 204-213.
    • (1995) Properties of Silicon Carbide, Ser. 13 , pp. 204-213
    • Nishino, S.1
  • 39
    • 1642427059 scopus 로고    scopus 로고
    • An overview of SiC epitaxial growth
    • Mar.
    • D. J. Larkin, "An overview of SiC epitaxial growth," Mater. Res. Soc. Bull., vol. 22, no. 3, pp. 37-40, Mar. 1997.
    • (1997) Mater. Res. Soc. Bull. , vol.22 , Issue.3 , pp. 37-40
    • Larkin, D.J.1
  • 40
    • 57649236751 scopus 로고    scopus 로고
    • SiC fabrication technology: Growth and doping
    • Y. S. Park, Ed. San Diego, CA: Academic
    • V. Dmitriev and M. G. Spencer, "SiC fabrication technology: Growth and doping," in SiC Materials and Devices, Semiconductors and Semimetals, Y. S. Park, Ed. San Diego, CA: Academic, 1998, vol. 52, pp. 21-75.
    • (1998) SiC Materials and Devices, Semiconductors and Semimetals , vol.52 , pp. 21-75
    • Dmitriev, V.1    Spencer, M.G.2
  • 44
    • 33646896664 scopus 로고
    • OMVPE of compound semiconductors
    • J. L. Vossen and W. Kern, Eds. San Diego, CA: Academic
    • T. F. Kuech and K. F. Jensen, "OMVPE of compound semiconductors," in Thin Film Processes II, J. L. Vossen and W. Kern, Eds. San Diego, CA: Academic, 1992, pp. 369-442.
    • (1992) Thin Film Processes II , pp. 369-442
    • Kuech, T.F.1    Jensen, K.F.2
  • 45
    • 0028761989 scopus 로고
    • Graphite as carbon source in chemical vapor deposition of α-silicon carbide
    • Dec.
    • K. Rottner and R. Helbig, "Graphite as carbon source in chemical vapor deposition of α-silicon carbide," J. Cryst. Growth, vol. 144, no. 3, pp. 258-266, Dec. 1994.
    • (1994) J. Cryst. Growth , vol.144 , Issue.3 , pp. 258-266
    • Rottner, K.1    Helbig, R.2
  • 46
    • 0026158174 scopus 로고
    • Thin film deposition and microelectronic and optoelectonic device fabrication and characterization in monocrystalline alpha and beta silicon carbide
    • May
    • R. F. Davis, et al., 'Thin film deposition and microelectronic and optoelectonic device fabrication and characterization in monocrystalline alpha and beta silicon carbide," Proc. IEEE, vol. 79, pp. 677-701, May 1991.
    • (1991) Proc. IEEE , vol.79 , pp. 677-701
    • Davis, R.F.1
  • 47
    • 0000079971 scopus 로고
    • An examination of double positioning boundaries and interface misfit in beta-SiC films on alpha-SiC substrates
    • Apr.
    • H. S. Kong, B.L. Jiang, J. T. Glass, G. A. Rozgonyi, and K. L. More, "An examination of double positioning boundaries and interface misfit in beta-SiC films on alpha-SiC substrates," J. Appl. Phys., vol. 63, no. 8, pp. 2645-2650, Apr. 1988.
    • (1988) J. Appl. Phys. , vol.63 , Issue.8 , pp. 2645-2650
    • Kong, H.S.1    Jiang, B.L.2    Glass, J.T.3    Rozgonyi, G.A.4    More, K.L.5
  • 48
    • 0035307708 scopus 로고    scopus 로고
    • DPBs-free and polytype controlled growth of SiC via surface etching on on-axis 6H-SiC (0001)
    • Apr.
    • Z. Y. Xie, J. H. Edgar, B. K. Burkland, J. T. George, and J. Chaudhuri, "DPBs-free and polytype controlled growth of SiC via surface etching on on-axis 6H-SiC (0001)," J. Cryst. Growth, vol. 224, no. 3, pp. 235-243, Apr. 2001.
    • (2001) J. Cryst. Growth , vol.224 , Issue.3 , pp. 235-243
    • Xie, Z.Y.1    Edgar, J.H.2    Burkland, B.K.3    George, J.T.4    Chaudhuri, J.5
  • 49
    • 0042746986 scopus 로고
    • Epitaxial growth of SC-SiC on α-SiC substrates by chemical vapor deposition
    • Bristol, U.K.: Inst. of Physics, Inst. of Physics Conference Series
    • K. Nishino, T. Kimoto, and H. Matsunami, "Epitaxial growth of SC-SiC on α-SiC substrates by chemical vapor deposition," in Silicon Carbide and Related Materials, ser. 137. Bristol, U.K.: Inst. of Physics, 1994, Inst. of Physics Conference Series, pp. 33-36.
    • (1994) Silicon Carbide and Related Materials, Ser. 137 , pp. 33-36
    • Nishino, K.1    Kimoto, T.2    Matsunami, H.3
  • 51
    • 0009314376 scopus 로고
    • Chemical vapor deposition and characterization of 6H-SiC thin films on off-axis 6H-SiC substrates
    • Sept.
    • H. S. Kong, J. T. Glass, and R. F. Davis, "Chemical vapor deposition and characterization of 6H-SiC thin films on off-axis 6H-SiC substrates," J. Appl. Phys., vol. 64, no. 5, pp. 2672-2679, Sept. 1988.
    • (1988) J. Appl. Phys. , vol.64 , Issue.5 , pp. 2672-2679
    • Kong, H.S.1    Glass, J.T.2    Davis, R.F.3
  • 52
    • 0023456959 scopus 로고
    • Fabrication of p-n junction diodes using homoepitaxially grown 6H-SiC at low temperature by chemical vapor deposition
    • Nov.
    • K. Shibahara, N. Kuroda, S. Nishino, and H. Matsunami, "Fabrication of p-n junction diodes using homoepitaxially grown 6H-SiC at low temperature by chemical vapor deposition," Jpn. J. Appl. Phys., vol. 26, no. 11, pp.L1815-1817, Nov. 1987.
    • (1987) Jpn. J. Appl. Phys. , vol.26 , Issue.11
    • Shibahara, K.1    Kuroda, N.2    Nishino, S.3    Matsunami, H.4
  • 53
    • 0001072754 scopus 로고
    • Growth of high-quality 6H-SiC epitaxial films on vicinal (0001) 6H-SiC wafers
    • Apr.
    • J. A. Powell, et al., "Growth of high-quality 6H-SiC epitaxial films on vicinal (0001) 6H-SiC wafers," Appl. Phys. Lett., vol. 56, no. 15, pp. 1442-1444, Apr. 1990.
    • (1990) Appl. Phys. Lett. , vol.56 , Issue.15 , pp. 1442-1444
    • Powell, J.A.1
  • 54
    • 0030262788 scopus 로고    scopus 로고
    • The role of excess silicon and insitu etching on 4H and 6H-SiC epitaxial layer morphology
    • Oct.
    • A. A. Burk, Jr. and L. B. Rowland, "The role of excess silicon and insitu etching on 4H and 6H-SiC epitaxial layer morphology," J. Cryst. Growth, vol. 167, no. 3, pp. 586-594, Oct. 1996.
    • (1996) J. Cryst. Growth , vol.167 , Issue.3 , pp. 586-594
    • Burk Jr., A.A.1    Rowland, L.B.2
  • 55
    • 0031484703 scopus 로고    scopus 로고
    • Process-induced morphological defects in epitaxial CVD silicon carbide
    • July
    • J. A. Powell and D. J. Larkin, "Process-induced morphological defects in epitaxial CVD silicon carbide," Phys. Stat. Sol. (b), vol. 202, no. 1, pp. 529-548, July 1997.
    • (1997) Phys. Stat. Sol. (b) , vol.202 , Issue.1 , pp. 529-548
    • Powell, J.A.1    Larkin, D.J.2
  • 56
    • 0000392094 scopus 로고    scopus 로고
    • Effect of vapor composition on polytype homogeneity of epitaxial silicon carbide
    • Nov.
    • A. O. Konstantinov, C. Hallin, O. Kordina, and E. Janzén, "Effect of vapor composition on polytype homogeneity of epitaxial silicon carbide," J. Appl. Phys., vol. 80, no. 10, pp. 5704-5712, Nov. 1996.
    • (1996) J. Appl. Phys. , vol.80 , Issue.10 , pp. 5704-5712
    • Konstantinov, A.O.1    Hallin, C.2    Kordina, O.3    Janzén, E.4
  • 57
    • 0031514277 scopus 로고    scopus 로고
    • Step-controlled epitaxial growth of high-quality SiC layers
    • July
    • T. Kimoto, A. Itoh, and H. Matsunami, "Step-controlled epitaxial growth of high-quality SiC layers," Phys. Stat. Sol. (b), vol. 202, no. 1, pp. 247-262, July 1997.
    • (1997) Phys. Stat. Sol. (b) , vol.202 , Issue.1 , pp. 247-262
    • Kimoto, T.1    Itoh, A.2    Matsunami, H.3
  • 58
    • 0035367945 scopus 로고    scopus 로고
    • Nitrogen incorporation during 4H-SiC epitaxy in a chimney CVD reactor
    • June
    • J. Zhang, A. Ellison, A. Henry, M. K. Linnarson, and E. Janzén, "Nitrogen incorporation during 4H-SiC epitaxy in a chimney CVD reactor," J. Cryst. Growth, vol. 226, no. 2, pp. 267-276, June 2001.
    • (2001) J. Cryst. Growth , vol.226 , Issue.2 , pp. 267-276
    • Zhang, J.1    Ellison, A.2    Henry, A.3    Linnarson, M.K.4    Janzén, E.5
  • 59
    • 0001213204 scopus 로고    scopus 로고
    • Surface diffusion lengths of adatoms on 6H-SiC (0001) faces in chemical vapor deposition of SiC
    • no. ?, MONTH
    • T. Kimoto and H. Matsunami, "Surface diffusion lengths of adatoms on 6H-SiC (0001) faces in chemical vapor deposition of SiC," J. Appl. Phys., vol. 78, no. ?, pp. 3132-3137, MONTH? 1996.
    • (1996) J. Appl. Phys. , vol.78 , pp. 3132-3137
    • Kimoto, T.1    Matsunami, H.2
  • 60
    • 0039918352 scopus 로고    scopus 로고
    • Homoepitaxial VPE growth of SiC active layers
    • July
    • A. A. Burk, Jr. and L. B. Rowland, "Homoepitaxial VPE growth of SiC active layers," Phys. Stat. Sol. (b), vol. 202, no. 1, pp. 263-279, July 1997.
    • (1997) Phys. Stat. Sol. (b) , vol.202 , Issue.1 , pp. 263-279
    • Burk Jr., A.A.1    Rowland, L.B.2
  • 61
    • 0016900132 scopus 로고
    • Epitaxial deposition of silicon carbide from silicon tetrachloride and hexanė
    • Jan.
    • W. Von Muench and I. Pfaffeneder, "Epitaxial deposition of silicon carbide from silicon tetrachloride and hexanė," Thin Solid Films, vol. 31, no. 1, pp. 39-51, Jan. 1976.
    • (1976) Thin Solid Films , vol.31 , Issue.1 , pp. 39-51
    • Von Muench, W.1    Pfaffeneder, I.2
  • 62
    • 21544437524 scopus 로고
    • Site-competition epitaxy for superior silicon carbide electronics
    • Sept.
    • D. J. Larkin, P. G. Neudeck, J. A. Powell, and L. G. Matus, "Site-competition epitaxy for superior silicon carbide electronics," Appl. Phys. Lett., vol. 65, no. 13, p. 1659, Sept. 1994.
    • (1994) Appl. Phys. Lett. , vol.65 , Issue.13 , pp. 1659
    • Larkin, D.J.1    Neudeck, P.G.2    Powell, J.A.3    Matus, L.G.4
  • 63
    • 0031674097 scopus 로고    scopus 로고
    • Nitrogen doping efficiency during vapor phase epitaxy of 4H-SiC
    • L. B. Rowland, A. A. Burk, Jr., and C. D. Brandt, "Nitrogen doping efficiency during vapor phase epitaxy of 4H-SiC," Mater. Sci. Forum, vol. 264-268, pp. 113-116, 1998.
    • (1998) Mater. Sci. Forum , vol.264-268 , pp. 113-116
    • Rowland, L.B.1    Burk Jr., A.A.2    Brandt, C.D.3
  • 64
    • 85092362639 scopus 로고    scopus 로고
    • Control of Al and B doping transients in 6H and 4H SiC grown by vapor phase epitaxy
    • Mar.
    • N. Nordell, A. Schoner, and M. K. Linnarsson, "Control of Al and B doping transients in 6H and 4H SiC grown by vapor phase epitaxy," J. Electron. Mater., vol. 26, no. 3, pp. 187-192, Mar. 1997.
    • (1997) J. Electron. Mater. , vol.26 , Issue.3 , pp. 187-192
    • Nordell, N.1    Schoner, A.2    Linnarsson, M.K.3
  • 65
    • 21544460438 scopus 로고    scopus 로고
    • Reduction of unintentional aluminum spikes in SiC vapor phase epitaxial layer/substrate interfaces
    • Jan.
    • A. A. Burk, Jr. and L. B. Rowland, "Reduction of unintentional aluminum spikes in SiC vapor phase epitaxial layer/substrate interfaces," Appl. Phys. Lett., vol. 68, no. 3, pp. 382-384, Jan. 1996.
    • (1996) Appl. Phys. Lett. , vol.68 , Issue.3 , pp. 382-384
    • Burk Jr., A.A.1    Rowland, L.B.2
  • 66
    • 36449006138 scopus 로고
    • Growth mechanism of 6H-SiC in step controlled epitaxy
    • Jan.
    • T. Kimoto, H. Nishino, W. S. Yoo, and H. Matsunami, "Growth mechanism of 6H-SiC in step controlled epitaxy," J. Appl. Phys., vol. 73, no. 2, pp. 726-732, Jan. 1993.
    • (1993) J. Appl. Phys. , vol.73 , Issue.2 , pp. 726-732
    • Kimoto, T.1    Nishino, H.2    Yoo, W.S.3    Matsunami, H.4
  • 67
    • 0031515387 scopus 로고    scopus 로고
    • 3C-SiC single crystal films grown on 6-inch Si substrates
    • July
    • H. Nagasawa and K. Yagi, "3C-SiC single crystal films grown on 6-inch Si substrates," Phys. Stat. Sol. (b), vol. 202, no. 1, pp. 335-358, July 1997.
    • (1997) Phys. Stat. Sol. (b) , vol.202 , Issue.1 , pp. 335-358
    • Nagasawa, H.1    Yagi, K.2
  • 68
    • 0033715399 scopus 로고    scopus 로고
    • Multi-wafer VPE growth and characterization of SiC epitaxial layers
    • H. D. Nordby, et al., "Multi-wafer VPE growth and characterization of SiC epitaxial layers," Mater. Sci. Forum, vol. 338-342, no. 1, pp. 173-176, 2000.
    • (2000) Mater. Sci. Forum , vol.338-342 , Issue.1 , pp. 173-176
    • Nordby, H.D.1
  • 69
    • 0032660207 scopus 로고    scopus 로고
    • SiC epitaxial layer growth in a novel multi-wafer vapor-phase epitaxial (VPE) reactor
    • Apr.
    • A. A. Burk, Jr., M. J. O'Loughlin, and H. D. Nordby, Jr., "SiC epitaxial layer growth in a novel multi-wafer vapor-phase epitaxial (VPE) reactor," J. Cryst. Growth, vol. 200, no. 3, pp. 458-466, Apr. 1999.
    • (1999) J. Cryst. Growth , vol.200 , Issue.3 , pp. 458-466
    • Burk Jr., A.A.1    O'Loughlin, M.J.2    Nordby Jr., H.D.3
  • 70
    • 0032668730 scopus 로고    scopus 로고
    • Epitaxial growth of SiC in a single and a multi wafer vertical CVD system: A comparison
    • R. Rupp, A. Wiedenhofer, and D. Stephani, "Epitaxial growth of SiC in a single and a multi wafer vertical CVD system: A comparison," Mater. Sci. Eng., vol. B61-62, pp. 125-129, 1999.
    • (1999) Mater. Sci. Eng. , vol.B61-62 , pp. 125-129
    • Rupp, R.1    Wiedenhofer, A.2    Stephani, D.3
  • 71
    • 0040951345 scopus 로고    scopus 로고
    • Epitaxial growth of SiC in a new multi-wafer VPE reactor
    • S. Karlsson, N. Nordell, F. Spadafora, and M. Linnarson, "Epitaxial growth of SiC in a new multi-wafer VPE reactor," Mater. Sci. Eng., vol. B61-62, pp. 143-146, 1999.
    • (1999) Mater. Sci. Eng. , vol.B61-62 , pp. 143-146
    • Karlsson, S.1    Nordell, N.2    Spadafora, F.3    Linnarson, M.4
  • 73
    • 0033721915 scopus 로고    scopus 로고
    • Al/C/B co-implanted high-voltage 4H-SiC PiN junction rectifiers
    • J. B. Fedison, et al., "Al/C/B co-implanted high-voltage 4H-SiC PiN junction rectifiers," Mater. Sci. Forum, vol. 338-342, no. 2, pp. 1367-1370, 2000.
    • (2000) Mater. Sci. Forum , vol.338-342 , Issue.2 , pp. 1367-1370
    • Fedison, J.B.1
  • 75
    • 3743152808 scopus 로고    scopus 로고
    • High growth rate of α-SiC by sublimation epitax
    • M. Syväjärvi et al., "High growth rate of α-SiC by sublimation epitax," Mater. Sci. Forum, vol. 264-268, no. 1, pp. 143-146, 1998.
    • (1998) Mater. Sci. Forum , vol.264-268 , Issue.1 , pp. 143-146
    • Syväjärvi, M.1
  • 76
    • 0001568436 scopus 로고    scopus 로고
    • Structural improvement in sublimation epitaxy of 4H-SiC
    • Aug.
    • M. Syväjärvi, R. Yakimova, H. Jacobsson, and E. Janzén, "Structural improvement in sublimation epitaxy of 4H-SiC," J. Appl Phys., vol. 88, no. 3, pp. 1407-1410, Aug. 2000.
    • (2000) J. Appl Phys. , vol.88 , Issue.3 , pp. 1407-1410
    • Syväjärvi, M.1    Yakimova, R.2    Jacobsson, H.3    Janzén, E.4
  • 77
    • 0003343627 scopus 로고
    • LPE of SiC and SiC-AlN
    • G. L. Harris, Ed. London, U.K.: INSPEC, EMIS Data Review
    • V. Dmitriev, "LPE of SiC and SiC-AlN," in Properties of Silicon Carbide, ser. 13, G. L. Harris, Ed. London, U.K.: INSPEC, 1995, EMIS Data Review, pp. 214-227.
    • (1995) Properties of Silicon Carbide, Ser. 13 , pp. 214-227
    • Dmitriev, V.1
  • 78
    • 84858896409 scopus 로고    scopus 로고
    • "Method for reducing micropipe formation in the epitaxial growth of silicon carbide and resulting silicon carbide structures," U.S. Patent 5679153, Oct. 21
    • V. A. Dmitriev, S. V. Rendakova, V. A. Ivantsov, and C. H. Carter, Jr., "Method for reducing micropipe formation in the epitaxial growth of silicon carbide and resulting silicon carbide structures," U.S. Patent 5679153, Oct. 21, 1997.
    • (1997)
    • Dmitriev, V.A.1    Rendakova, S.V.2    Ivantsov, V.A.3    Carter Jr., C.H.4
  • 79
    • 0035932292 scopus 로고    scopus 로고
    • Material quality improvements for high voltage 4H-SiC diodes
    • E. Kalinina, et al., "Material quality improvements for high voltage 4H-SiC diodes," Mater. Sci. Eng., vol. B180, pp. 337-341, 2001.
    • (2001) Mater. Sci. Eng. , vol.B180 , pp. 337-341
    • Kalinina, E.1
  • 80
    • 0001608765 scopus 로고    scopus 로고
    • High temperature chemical vapor deposition of SiC
    • Sept.
    • O. Kordina, et al., "High temperature chemical vapor deposition of SiC,"Appl. Phys. Lett., vol. 69, no. 10, pp. 1456-1458, Sept. 1996.
    • (1996) Appl. Phys. Lett. , vol.69 , Issue.10 , pp. 1456-1458
    • Kordina, O.1
  • 81
    • 0008859170 scopus 로고    scopus 로고
    • HTCVD growth of semi-insulating 4H-SiC crystals with low defect density
    • A. Ellison, el al., "HTCVD growth of semi-insulating 4H-SiC crystals with low defect density," in Proc. Mater. Res. Soc. Symp., vol. 640, 2001.
    • (2001) Proc. Mater. Res. Soc. Symp. , vol.640
    • Ellison, A.1
  • 82
    • 12944286624 scopus 로고    scopus 로고
    • Fast SiC epitaxial growth in a chimney CVD reactor and HTCVD crystal growth developments
    • A. Ellison, et al., "Fast SiC epitaxial growth in a chimney CVD reactor and HTCVD crystal growth developments," in Mater. Sci. Forum, vol. 338-342, 2000, pp. 131-136.
    • (2000) Mater. Sci. Forum , vol.338-342 , pp. 131-136
    • Ellison, A.1
  • 83
    • 18844479353 scopus 로고    scopus 로고
    • Electrical impact of SiC structural crystal defects on high electric field devices
    • P. G. Neudeck, "Electrical impact of SiC structural crystal defects on high electric field devices," Mater. Sci Forum, vol. 338-342, no. 2, p. 1161, 2000.
    • (2000) Mater. Sci Forum , vol.338-342 , Issue.2 , pp. 1161
    • Neudeck, P.G.1


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