|
Volumn 640, Issue , 2001, Pages
|
HTCVD growth of semi-insulating 4H-SiC crystals with low defect density
a a a a a a a a a |
Author keywords
[No Author keywords available]
|
Indexed keywords
ACTIVATION ENERGY;
CHEMICAL VAPOR DEPOSITION;
CRYSTAL DEFECTS;
CRYSTAL GROWTH;
CRYSTAL STRUCTURE;
DOPING (ADDITIVES);
ELECTRIC PROPERTIES;
HEAT RESISTANCE;
HIGH TEMPERATURE EFFECTS;
INSULATING MATERIALS;
OPTICAL PROPERTIES;
SUBLIMATION;
DEFECT DENSITY;
GAS FED SUBLIMATION;
MICROPIPE CLOSING;
ROOM TEMPERATURE RESISTIVITY;
SEMIINSULATING CRYSTALS;
SURFACE PREPARATION;
TRAPPING EFFECTS;
SILICON CARBIDE;
|
EID: 0008859170
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (51)
|
References (25)
|