Photo-induced atomic layer deposition of tantalum oxide thin films from Ta(OC2H5)5 and O2

Journal of the Electrochemical Society

Volumn 151, Issue 1, 2004, Pages

  Lee, Young Hoon ^a   Kwak, Jae Chan ^a   Gang, Bong Suck ^a   Kim, Hie Chul ^a   Choi, Byung Ho ^b   Jeong, Bong Kyo ^b   Park, Sung Ho ^b   Lee, Kyuoung Ho ^b  

^a Kumoh National Institute of Technology   (South Korea)

^b Product and Process Development   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; CAPACITORS; ELECTRODEPOSITION; FILM GROWTH; PERMITTIVITY; REFRACTIVE INDEX; STOICHIOMETRY; TEMPERATURE; THIN FILMS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

OPTICAL BANDGAP; PHOTOINDUCED ATOMIC LAYER DEPOSITION; TANTALUM OXIDE THIN FILMS;

TANTALUM COMPOUNDS;

EID: 0842268434     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1629096     Document Type: Article

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