Photo-deposition of tantalum pentoxide film using 222 nm excimer lamps

Applied Surface Science

Volumn 168, Issue 1-4, 2000, Pages 307-311

  Zhang, Jun Ying ^a   Hopp, B ^b   Geretovszky, Z ^b   Boyd, Ian W ^a  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

^b RESEARCH GROUP ON LASER PHYSICS   (Hungary)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; ELLIPSOMETRY; ENERGY GAP; EXCIMER LASERS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PERMITTIVITY; REFRACTIVE INDEX; TANTALUM COMPOUNDS; THIN FILMS; ULTRAVIOLET SPECTROPHOTOMETERS;

PHOTO-INDUCED CHEMICAL VAPOR DEPOSITION;

DIELECTRIC FILMS;

EID: 0034510746     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00768-6     Document Type: Article

References (21)

1. Matsui M., Nagayoshi H., Muto G., Tanimoto S., Kuroiwa K., Tarui Y. Jpn. J. Appl. Phys. Part 1. 29:1990;62.
2. Terui H., Kobayashi M. Appl. Phys. Lett. 32:1978;666.
3. Zhang J.-Y., Bie L.-J., Boyd I.W. Jpn. J. Appl. Phys. Part 2. 37:1998;L27.
4. Nakagawa Y., Okada T. J. Appl. Phys. 68:1990;556.
5. Tanimoto S., Matsui M., Kamisako K., Kuroiwa K., Tarui Y. J. Electrochem. Soc. 139:1992;320.
6. Nishimura Y., Tokunaga K., Tsuji M. Thin Solid Films. 226:1993;144.
7. Kwon K.W., Kang C.S., Park S.O., Kang H.K., Ahn S.T. IEEE Trans. Electron Devices. 43:1996;919.
8. Zhang J.-Y., Lim B., Dusastre V., Boyd I.W. Appl. Phys. Lett. 73:1998;2299.
9. Pignolet A., Rao G.M., Krupanidhi S.B. Thin Solid Films. 258:1995;230.
10. Sun S.C., Chen T.F. IEEE Electron Device Lett. 17:1996;355.
11. Park S.W., Baek Y.K., Lee J.Y., Park C.O., Im H.B. J. Electron. Mater. 21:1992;635.
12. Zaima S., Furuta T., Koide Y., Yasuda Y. J. Electrochem. Soc. 137:1992;2876.
13. Kamiyama S., Lesaicherre P., Suzuki H., Sakai A., Ishitani A. J. Electrochem. Soc. 140:1993;1617.
14. Autran J.L., Paillet P., Leray J.L., Devine andR.A.B. Sens. Actuators A. 51:1995;5.
15. Zhang J.-Y., Dusastre V., Williams D.E., Boyd I.W. J. Phys. D: Appl. Phys. 32:1999;L1.
16. Shinriki H., Nakata M. IEEE Trans. Electron. Dev. 38:1991;455.
17. Zhang J.-Y., Fang Q., Boyd I.W. Appl. Surface Sci. 138:1999;320.
18. Zhang J.-Y., Lim B., Boyd W. Thin Solid Films. 336:1998;340.
19. Zhang J.-Y., Esrom H. Appl. Surface Sci. 54:1992;465.
20. Weltner W., McLeod D. J. Chem. Phys. 42:1965;882.
21. Tauc J., Grigorovich R., Vancu A. Phys. Statist. Sol. 15:1966;627.