Coagulation in a low-temperature plasma

Journal of Physics D: Applied Physics

Volumn 29, Issue 3, 1996, Pages 655-659

  Schweigert, Vitaly A ^a   Schweigert, Irina V ^a  

^a KHRISTIANOVICH INSTITUTE OF THEORETICAL AND APPLIED MECHANICS   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; ARGON; CALCULATIONS; CHARGED PARTICLES; COAGULATION; LOW TEMPERATURE PROPERTIES; NUMERICAL METHODS; PRESSURE EFFECTS; SILICON;

GAS PRESSURE; MAXWELLIAN VELOCITY DISTRIBUTION; NEUTRAL PARTICLES; NONSTATIONARY KINETIC EQUATION; SILICON PARTICLES;

PLASMAS;

EID: 0030105241     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/29/3/026     Document Type: Article

References (6)

1. Spears K G, Robinson T M and Roth RM 1986 IEEE Trans. Plasma. Sci. 14 179
2. Selwyn G S, Singh J and Bennett R S 1989 J. Vac. Sci. Technol. A 7 2758
3. Bouchoule A, Plain A, Boufendi L, Blondeau J Ph and Laure C 1991 J. Appl. Phys. 70 1991
4. Schweigen V A and Schweigen I V 1993 Proc. XXI Int. Conf. on Phenomena in Ionized Gases, Bochum part II (Arbeitsgemeinschaft Plasmaphysik) pp 245-6
5. Allen J E 1992 Phys. Scr. 45 497-503
6. Boufendi L and Bouchoule A 1992 Proc. ESCAMPIG-92, St Peterburg (European Physical Society) p 447