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Contributions to Plasma Physics

Volumn 41, Issue 6, 2001, Pages 598-609

Micro-disperse particles in plasmas: From disturbing side effects to new applications

(6) Kersten, H a Deutsch, H a Stoffels, E b Stoffels, W W b Kroesen, G M W b Hippler, R a

a UNIVERSITY OF GREIFSWALD (Germany)

b EINDHOVEN UNIVERSITY OF TECHNOLOGY (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035730852 PISSN: 08631042 EISSN: None Source Type: Journal
DOI: 10.1002/1521-3986(200111)41:6<598::AID-CTPP598>3.0.CO;2-Z Document Type: Article

Times cited : (74)

References (74)

1
- 0002181337
- KROESEN, G.M.W., Phys. World 9(1996), 25.
- (1996) Phys. World , vol.9 , pp. 25
- Kroesen, G.M.W.¹

2
- 84955025395
- SELWYN, G.S., MCKILLOP, J.S., HALLER, K.L., WU, J.J., J.Vac.Sci.Technol. A8(1990), 1726.
- (1990) J.Vac.Sci.Technol. , vol.A8 , pp. 1726
- Selwyn, G.S.¹ McKillop, J.S.² Haller, K.L.³ Wu, J.J.⁴

3
- 0039945205
- Dusty plasmas: Physics, chemistry and technological impacts in plasma processing
- BOUCHOULE, A. (Ed.): "Dusty Plasmas: Physics, Chemistry and Technological Impacts in Plasma Processing", J.Wiley & Sons 1999.
- (1999) J.Wiley & Sons
- Bouchoule, A.¹

4
- 0042993123
- STOFFELS, E., STOFFELS, W.W., KERSTEN, H., SWINKELS, G.H.P.M., KROESEN, G.M.W., Physica Scripta T89(2001), 168.
- (2001) Physica Scripta , vol.T89 , pp. 168
- Stoffels, E.¹ Stoffels, W.W.² Kersten, H.³ Swinkels, G.H.P.M.⁴ Kroesen, G.M.W.⁵

5
- 0032305119
- STOFFELS, E., STOFFELS, W.W., KROESEN, G.M.W., DEHOOG, F.J., Electron Technology 31(1998), 255.
- (1998) Electron Technology , vol.31 , pp. 255
- Stoffels, E.¹ Stoffels, W.W.² Kroesen, G.M.W.³ Dehoog, F.J.⁴

6
- 85009316617
- ICPIG, Warsaw, Poland proc. IV/109
- LAW, D.A., TOMME, E.B., STEEL, W.H., ANARATONNE, B.M., ALLEN, J.E., Proc. XXIV. ICPIG, Warsaw, Poland 1999, proc. IV/109.
- (1999) Proc. XXIV
- Law, D.A.¹ Tomme, E.B.² Steel, W.H.³ Anaratonne, B.M.⁴ Allen, J.E.⁵

7
- 0034509126
- KERSTRN, H., DEUTSCH, H., OTTE. M., SWINKELS, G.H.P.M., KROESEN, G.M.W., Thin Solid Films 377-378(2000). 530.
- (2000) Thin Solid Films , vol.377-378 , pp. 530
- Kerstrn, H.¹ Deutsch, H.² Otte, M.³ Swinkels, G.H.P.M.⁴ Kroesen, G.M.W.⁵

8
- 0001686201
- SWINKELS, G.H.P.M., KERSTEN, H., DEUTSCH, H., KROESEN, G.M.W., J.Appl.Phys. 88(2000), 1747.
- (2000) J.Appl.Phys. , vol.88 , pp. 1747
- Swinkels, G.H.P.M.¹ Kersten, H.² Deutsch, H.³ Kroesen, G.M.W.⁴

9
- 33646175630
- SELWYN, G.S., SINGH, J., BENETT, R.S., J.Vac.Sci.Teclmol. A7(1988). 2758.
- (1988) J.Vac.Sci.Teclmol. , vol.A7 , pp. 2758
- Selwyn, G.S.¹ Singh, J.² Benett, R.S.³

10
- 0002119976
- BOUCHOULE, A., Phys. World 6(1993). 47.
- (1993) Phys. World , vol.6 , pp. 47
- Bouchoule, A.¹

11
- 0000148534
- HOFMEISTER, H., DUTA, J., HOFMANN, H., Phyw.Rev. B 54(1990). 2856.
- (1990) Phyw.Rev. B , vol.54 , pp. 2856
- Hofmeister, H.¹ Duta, J.² Hofmann, H.³

12
- 0032182486
- KERSTEN, H., SCHMETZ, P., KROESEN, G.M.W., Sirf.Coat.Technol. 108-109(1998). 507.
- (1998) Sirf.Coat.Technol. , vol.108-109 , pp. 507
- Kersten, H.¹ Schmetz, P.² Kroesen, G.M.W.³

13
- 0001127041
- HOLLENSTEIN, C., DORIER, J.L., DUTA, J., SANSONNENS, L., HOWLING, A.A., Plasma Sources Sci.Technol. 3(1994), 278.
- (1994) Plasma Sources Sci.Technol. , vol.3 , pp. 278
- Hollenstein, C.¹ Dorier, J.L.² Duta, J.³ Sansonnens, L.⁴ Howling, A.A.⁵

14
- 0001118780
- TACHIBANA, K., HAYASHI, Y., Pure Appl.Chem. 68(1996), 1107.
- (1996) Pure Appl.Chem. , vol.68 , pp. 1107
- Tachibana, K.¹ Hayashi, Y.²

15
- 85009317829
- ICPIG, Toulouse. France proc. I/200
- VIVET, F., BOUCHOULE, A., BOUFENDI, L., Proc. XXIII. ICPIG, Toulouse. France 1997, proc. I/200.
- (1997) Proc. XXIII
- Vivet, F.¹ Bouchoule, A.² Boufendi, L.³

16
- 0001264634
- ROCA I CABAROCAS, P., GAY, P., HADJADJ, A., J.VaC.Sci.Technol. A14(1996).655.
- (1996) J.Vac.Sci.Technol. , vol.A14 , pp. 655
- Roca, I.¹ Cabarocas, P.² Gay, P.³ Hadjadj, A.⁴

17
- 36449001310
- VEPREK, S., REIPRICH, S., SHIZI, L., Appl.Phys.Lett, 66(1995). 2640.
- (1995) Appl.Phys.Lett , vol.66 , pp. 2640
- Veprek, S.¹ Reiprich, S.² Shizi, L.³

18
- 3743151020
- THOMAS, H., MORFILL, G.E. DEMMEL, V., GOREE, J., FEUKRBACHER, B., MÖHLMANN, D., Phys.Rev.Lett, 73(1994). 652.
- (1994) Phys.Rev.Lett , vol.73 , pp. 652
- Thomas, H.¹ Morfill, G.E.² Demmel, V.³ Goree, J.⁴ Feukrbacher, B.⁵ Möhlmann, D.⁶

19
- 5344260405
- MELZER, A., HOMANN, A., PIEL, A., Phys.Rev. E 53(1996). 2757.
- (1996) Phys.Rev. E , vol.53 , pp. 2757
- Melzer, A.¹ Homann, A.² Piel, A.³

20
- 0034683282
- TOMME, E.B., LAW, D.A., ANNARATONE, B.M., ALLEN, J.E., Phys.Rev.Lett. 85(2000). 2518.
- (2000) Phys.Rev.Lett. , vol.85 , pp. 2518
- Tomme, E.B.¹ Law, D.A.² Annaratone, B.M.³ Allen, J.E.⁴

21
- 0001650517
- CHOI, S.J., KUSHNER, M.J., J.Appl.Phys. 75(1994), 3351.
- (1994) J.Appl.Phys. , vol.75 , pp. 3351
- Choi, S.J.¹ Kushner, M.J.²

22
- 85009315480
- BOUCHOULE, A., BUFENDI, L., Plasma Sources Sci.Technol. 3(1994). 293.
- (1994) Plasma Sources Sci.Technol. , vol.3 , pp. 293
- Bouchoule, A.¹ Bufendi, L.²

23
- 0032203127
- NAIRN, C.M.C., ANNARATONE, B.M., ALLEN, J.E., Plasma Sourc.Sci.Technol. 7(1998). 478.
- (1998) Plasma Sourc.Sci.Technol. , vol.7 , pp. 478
- Nairn, C.M.C.¹ Annaratone, B.M.² Allen, J.E.³

24
- 0001412335
- SEEBÖCK, R.J., BOHME, W., KÖHLER, W.E., RÖMHELD, M., VEPREK, S., Plasma. Sources Sci.Tcchnol. 3(1994). 359.
- (1994) Plasma. Sources Sci.Technol. , vol.3 , pp. 359
- Seeböck, R.J.¹ Bohme, W.² Köhler, W.E.³ Römheld, M.⁴ Veprek, S.⁵

25
- 0028416448
- CHUNSHI, C., GOREE, J., IEEE Trans.Plasma Sci. 22(1994). 151.
- (1994) IEEE Trans.Plasma Sci. , vol.22 , pp. 151
- Chunshi, C.¹ Goree, J.²

26
- 85009306117
- PhD thesis. Technical University of Eindhoven. The Netherlands
- STOFFELS, E., STOFFELS, W. W., PhD thesis. Technical University of Eindhoven. The Netherlands 1994.
- (1994)
- Stoffels, E.¹ Stoffels, W.W.²

27
- 0001532788
- KLlNDWOHTH, M., MELZER, A., PIEL, A., Phys.Rev. B 61(2000). 8404.
- (2000) Phys.Rev. B , vol.61 , pp. 8404
- Kllndwohth, M.¹ Melzer, A.² Piel, A.³

28
- 0011960766
- BRATTLI, A., HAVNES, O., J.Vac.Sci.Teclmol. A14(1996), 646.
- (1996) J.Vac.Sci.Teclmol. , vol.A14 , pp. 646
- Brattli, A.¹ Havnes, O.²

29
- 84957224325
- DAUGHERTY, J.E., GRAVES, D.B., J.Vac.Sci.Terlmol. A11(1993). 1126.
- (1993) J.Vac.Sci.Terlmol. , vol.A11 , pp. 1126
- Daugherty, J.E.¹ Graves, D.B.²

30
- 0000473225
- SELWYN, G.S., Plasma Sources Sci.Technol. 3(1994), 340.
- (1994) Plasma Sources Sci.Technol. , vol.3 , pp. 340
- Selwyn, G.S.¹

31
- 0031074089
- LAPENTA, G., BRACKHILL, J.U., Plasma Sources Sci.Technol. 6(1997). 61.
- (1997) Plasma Sources Sci.Technol. , vol.6 , pp. 61
- Lapenta, G.¹ Brackhill, J.U.²

32
- 0028416982
- BÖHME, W., KÖHLERM, W.E., RÖMHELD, M., VEPREK, S., SEEBÖCK, R.J., IEEE Trans. Plasma Sci. 22(1994). 110.
- (1994) IEEE Trans. Plasma Sci. , vol.22 , pp. 110
- Böhme, W.¹ Köhlerm, W.E.² Römheld, M.³ Veprek, S.⁴ Seeböck, R.J.⁵

33
- 0030104632
- HOLLENSTEIN, C., SCHWARZENBACH, W., HOWLING, A.A., COURTEILLE, C., J.Vac.Sci.Technol. A14(1996), 535.
- (1996) J.Vac.Sci.Technol. , vol.A14 , pp. 535
- Hollenstein, C.¹ Schwarzenbach, W.² Howling, A.A.³ Courteille, C.⁴

34
- 0030527959
- STOFFELS, E., STOFFKLS, W.W., KROESEN, G.M.W., DEHOOG, F.J., J.Vac.Sci.Technol. A14(1996). 556.
- (1996) J.Vac.Sci.Technol. , vol.A14 , pp. 556
- Stoffels, E.¹ Stoffkls, W.W.² Kroesen, G.M.W.³ Dehoog, F.J.⁴

35
- 0028462569
- BOUFENDl. L., HERMANN, J., BOUCHOULE, A., DUBREUIL, B., STOFFELS, E., STOFFELS, W.W., AND DE GIORGI, M.L., J.Appl.Phys. 76 (1994). p. 148.
- (1994) J.Appl.Phys. , vol.76 , pp. 148
- Boufendl, L.¹ Hermann, J.² Bouchoule, A.³ Dubreuil, B.⁴ Stoffels, E.⁵ Stoffels, W.W.⁶ De Giorgi, M.L.⁷

36
- 0000613904
- FUKUZAWA, T., OBATA, K., KAWASAKI, H., SHIRATANI, M., AND WATANABE, Y., J.Appl.Phys. 80(1996), p. 3202.
- (1996) J.Appl.Phys. , vol.80 , pp. 3202
- Fukuzawa, T.¹ Obata, K.² Kawasaki, H.³ Shiratani, M.⁴ Watanabe, Y.⁵

37
- 0001402789
- BOUCHOULE, A., BOUFENDI, L., HERMANN, J., PLAIN, A., HBID, T., KROESEN, G.M.W., STOFFELS, E., STOFFELS, W.W., Pure & Appl.Chem. 68(1996), 1121-1126.
- (1996) Pure & Appl.Chem. , vol.68 , pp. 1121-1126
- Bouchoule, A.¹ Boufendi, L.² Hermann, J.³ Plain, A.⁴ Hbid, T.⁵ Kroesen, G.M.W.⁶ Stoffels, E.⁷ Stoffels, W.W.⁸

38
- 0001489250
- STOFFELS, W.W., STOFFELS, E., SWINKELS, G.H.P.M., BOUFNICHEL, M., AND KROESEN, G.M.W., Phys.Rev. E. 59(1999), p. 2302.
- (1999) Phys.Rev. E. , vol.59 , pp. 2302
- Stoffels, W.W.¹ Stoffels, E.² Swinkels, G.H.P.M.³ Boufnichel, M.⁴ Kroesen, G.M.W.⁵

39
- 0000590902
- KLICK, M., J.Appl.Phys. 79(1996). 3445.
- (1996) J.Appl.Phys. , vol.79 , pp. 3445
- Klick, M.¹

40
- 0000934318
- ANDERSON, H.H., Plasma Sources Sci.Technol. 3(1994). 302.
- (1994) Plasma Sources Sci.Technol. , vol.3 , pp. 302
- Anderson, H.H.¹

41
- 0038090633
- STOFFELS, W.W., STOFFELS, E., KROESEN, G.M.W., HAVERLAG, M., DEN BOER, J.H.W.G., DE HOOG, F.J., Plasma Sources Sci.Tochnol. 3(1994), 329-324.
- (1994) Plasma Sources Sci.Technol. , vol.3 , pp. 329-1324
- Stoffels, W.W.¹ Stoffels, E.² Kroesen, G.M.W.³ Haverlag, M.⁴ Den Boer, J.H.W.G.⁵ De Hoog, F.J.⁶

42
- 36149034135
- GARSCADDEN, A., GANGULY, B.N., HAALAND, P.D., WILLIAMS, J., Plasma Sources Sci.Techmol. 3(1994), 239.
- (1994) Plasma Sources Sci.Techmol. , vol.3 , pp. 239
- Garscadden, A.¹ Ganguly, B.N.² Haaland, P.D.³ Williams, J.⁴

43
- 0029544542
- KEIDAR, M., BEILIS, I.I., BOXMAN, R.L., IEEE Trans.Plasma Sci. 23(1995). 902.
- (1995) IEEE Trans.Plasma Sci. , vol.23 , pp. 902
- Keidar, M.¹ Beilis, I.I.² Boxman, R.L.³

44
- 0001752464
- BEILIS.I.I., KEIDAR, M., BOXMAN, R.L., GOLDSMITH, S., J.Appl.Phys. 85(1999). 1358.
- (1999) J.Appl.Phys. , vol.85 , pp. 1358
- Beilis, I.I.¹ Keidar, M.² Boxman, R.L.³ Goldsmith, S.⁴

45
- 0033449987
- SCHULTRICH, B., Contrib.Plasma Phys. 39(1999), 463.
- (1999) Contrib.Plasma Phys. , vol.39 , pp. 463
- Schultrich, B.¹

46
- 0011954531
- XENOULIS, A.C., DOUKELIJS, G., TSOURIS, P., KARYDAS, A., POTIRIADIS, C., KATSANOS, A.C., TSAKALAKOS, TH., Vacuum 51(1998) 357.
- (1998) Vacuum , vol.51 , pp. 357
- Xenoulis, A.C.¹ Doukelijs, G.² Tsouris, P.³ Karydas, A.⁴ Potiriadis, C.⁵ Katsanos, A.C.⁶ Tsakalakos, T.H.⁷

47
- 0032096758
- WINTER, J., Plasma Phys.Control.Fusion 40(1998), 1201.
- (1998) Plasma Phys.Control.Fusion , vol.40 , pp. 1201
- Winter, J.¹

48
- 0032666198
- WINTER, J., GEBAUER, G., J.Nucl.Mat. 266-269(1999), 228.
- (1999) J.Nucl.Mat. , vol.266-269 , pp. 228
- Winter, J.¹ Gebauer, G.²

49
- 0031199977
- NAHIHARA, K., TOI, K., HAMADA, Y., Nucl.Fusion 37(1996), 1177.
- (1996) Nucl.Fusion , vol.37 , pp. 1177
- Nahihara, K.¹ Toi, K.² Hamada, Y.³

50
- 0011954532
- DALVIE, M., SELWYN, G.S., SURENDRA, M., GUARNIERI, C.R., MCGlLL, J.J., Appl.Phys.Lett. 63(1993). 3279.
- (1993) Appl.Phys.Lett. , vol.63 , pp. 3279
- Dalvie, M.¹ Selwyn, G.S.² Surendra, M.³ Guarnieri, C.R.⁴ McGill, J.J.⁵

51
- 0031538533
- YEON, C.K., WHANG, K.W., J.Vac.Sci.Technol. A15(1997), 66.
- (1997) J.Vac.Sci.Technol. , vol.A15 , pp. 66
- Yeon, C.K.¹ Whang, K.W.²

52
- 0001723218
- WATANABE, Y., SHIRANTI, M., MAKINO, H., Appl.Phys.Lett. 57(1990), 1616.
- (1990) Appl.Phys.Lett. , vol.57 , pp. 1616
- Watanabe, Y.¹ Shiranti, M.² Makino, H.³

53
- 0035302788
- UCHIDA, G., IIZUKA, S., SATO, N., IEEE Trans.Plasma Sci. 29(2001). 274.
- (2001) IEEE Trans.Plasma Sci. , vol.29 , pp. 274
- Uchida, G.¹ Iizuka, S.² Sato, N.³

54
- 0030165922
- ONOZUKA, M., UEDA, Y., TAKAHASHI, K., SEKI, Y., UEDA, S., AOKI, I., Vacuum 47(1996), 541.
- (1996) Vacuum , vol.47 , pp. 541
- Onozuka, M.¹ Ueda, Y.² Takahashi, K.³ Seki, Y.⁴ Ueda, S.⁵ Aoki, I.⁶

55
- 0028699869
- PERRIN, J., MOLINAS-MATA, P., BELENGUER, P.H., J.Phys.D: Appl.Phys. 27(1094), 2499.
- (1994) J.Phys.D: Appl.Phys. , vol.27 , pp. 2499
- Perrin, J.¹ Molinas-Mata, P.² Belenguer, P.H.³

56
- 0000375249
- KOGELSCHATZ, U., ELIASSON, B., EGLI, W., Pure Appl.Chem. 71(1999). 1819.
- (1999) Pure Appl.Chem. , vol.71 , pp. 1819
- Kogelschatz, U.¹ Eliasson, B.² Egli, W.³

57
- 21844512157
- RAO, N., GIRSHICK, S., HEBERLEIN, J., MCMURRY, P., JONES, S., HANSEN, D., MICHEEL, B., Plasma Chem.Plasma Proc. 15(1995), 581.
- (1995) Plasma Chem.Plasma Proc. , vol.15 , pp. 581
- Rao, N.¹ Girshick, S.² Heberlein, J.³ McMurry, P.⁴ Jones, S.⁵ Hansen, D.⁶ Micheel, B.⁷

58
- 0041132046
- Hoboken proc. 363
- SCHOLL, R., NATOUR, G., ICPIG-XXII, Hoboken 1995, proc. 363.
- (1995) ICPIG-XXII
- Scholl, R.¹ Natour, G.²

59
- 0029509905
- ISHIGAKI, T., SATO, T., MORIYOSHI, Y., BOULOS, M.I., J.Mat.Sci.Lott. 14(1095). 1694.
- (1995) J.Mat.Sci.Lott. , vol.14 , pp. 1694
- Ishigaki, T.¹ Sato, T.² Moriyoshi, Y.³ Boulos, M.I.⁴

60
- 0040628653
- VEPREK, S., Pure Appl.Chem. 68(1996), 1023.
- (1996) Pure Appl.Chem. , vol.68 , pp. 1023
- Veprek, S.¹

61
- 0034412217
- SCHULTRICH, B., SCHEIBE, H.J., MAI, H., Adv.Eug.Mater. 2(2000), 419.
- (2000) Adv.Eug.Mater. , vol.2 , pp. 419
- Schultrich, B.¹ Scheibe, H.J.² Mai, H.³

62
- 0027576431
- YAN, S., MAEDA, H., KUSAKABE, J.I., MOROOKA, K., OKUBO, T., J.Mater.Sci. 28(1993), 1829.
- (1993) J.Mater.Sci. , vol.28 , pp. 1829
- Yan, S.¹ Maeda, H.² Kusakabe, J.I.³ Morooka, K.⁴ Okubo, T.⁵

63
- 21844488396
- PRABURAN, G., GOREE, J., J.Vac.Sci.Technol. A12(1994). 3137.
- (1994) J.Vac.Sci.Technol. , vol.A12 , pp. 3137
- Praburan, G.¹ Goree, J.²

64
- 0011965282
- STOFFELS, E., STOFFELS, W.W., CECCONE, G., HASNAOUl, R., KEUNE, H., WAHL, G. AND Rossi, F., J.Appl.Phys. 86(1999). p. 3442.
- (1999) J.Appl.Phys. , vol.86 , pp. 3442
- Stoffels, E.¹ Stoffels, W.W.² Ceccone, G.³ Hasnaoul, R.⁴ Keune, H.⁵ Wahl, G.⁶ Rossi, F.⁷

65
- 0039945170
- Nara proc. 357
- KlTAMURA, K., AKUTSU, S., ITO, S. AKASHI, K., ICRP-3. Nara 1997, proc. 357.
- (1997) ICRP-3.
- Kltamura, K.¹ Akutsu, S.² Ito, S.³ Akashi, K.⁴

66
- 0040538050
- Greifswald proc. 68
- THIEME, G., QUAAS, M., KERSTEN, H., WULFF, H., HIPPLER, R., BFPT-10. Greifswald 2001. proc. 68.
- (2001) BFPT-10
- Thieme, G.¹ Quaas, M.² Kersten, H.³ Wulff, H.⁴ Hippler, R.⁵

67
- 0032476355
- KERSTEN, H., KROESEN, G.M.W., HIPPLER, R., Thin Solid Films 332(1998). 282.
- (1998) Thin Solid Films , vol.332 , pp. 282
- Kersten, H.¹ Kroesen, G.M.W.² Hippler, R.³

68
- 0028416748
- SHIN, H.S., GOODWIN, S.G.??. Mat.Lett. 19(1994). 119.
- (1994) Mat.Lett. , vol.19 , pp. 119
- Shin, H.S.¹ Goodwin, S.G.²

69
- 0032520240
- PARK, S.H., KIM, S.D., Colloids and Surf. 133(1998), 33.
- (1998) Colloids and Surf , vol.133 , pp. 33
- Park, S.H.¹ Kim, S.D.²

70
- 0033381417
- KARCHES, M., BAYER, C., VON ROHR, P.R., Surf.Coat.Technol. 119(1999). 879.
- (1999) Surf.Coat.Technol. , vol.119 , pp. 879
- Karches, M.¹ Bayer, C.² Von Rohr, P.R.³

71
- 0000781871
- HOMANN, A., MELZER, A., PIEL, A., Phys.Rev. E 59(1999). R3835.
- (1999) Phys.Rev. E , vol.59 , pp. R3835
- Homann, A.¹ Melzer, A.² Piel, A.³

72
- 0034271866
- MELZER, A., NUNOMURA, S., SAMSONOV, D., MA, Z.W., GOREE, J., Phys.Rev. E 62 (2000), 4162.
- (2000) Phys.Rev. E , vol.62 , pp. 4162
- Melzer, A.¹ Nunomura, S.² Samsonov, D.³ Ma, Z.W.⁴ Goree, J.⁵

73
- 0033743211
- TOMME, E.B., ANNARATONE, B.M., ALLEN, J.E., Plasma Sourc.Sci.Tec??lmol. 9(2000), 87.
- (2000) Plasma Sourc.Sci.Techmol. , vol.9 , pp. 87
- Tomme, E.B.¹ Annaratone, B.M.² Allen, J.E.³

74
- 0035797580
- KERSTEN, H., DEUTSCH, H., STEFFEN, H., KROESEN, G.M.W., HIPPLER, R., Vacuum 63(2001). 385.
- (2001) Vacuum , vol.63 , pp. 385
- Kersten, H.¹ Deutsch, H.² Steffen, H.³ Kroesen, G.M.W.⁴ Hippler, R.⁵

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