Contribution of short lifetime radicals to the growth of particles in SiH4 high frequency discharges and the effects of particles on deposited films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 3, 1996, Pages 995-1001

  Watanabe, Yukio ^a   Shiratani, Masaharu ^a   Fukuzawa, Tsuyoshi ^a   Kawasaki, Hiroharu ^a   Ueda, Yoshio ^a   Singh, Sanjay ^a   Ohkura, Hiroshi ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 5844403482     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580069     Document Type: Article

References (21)

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