Standing surface waves in a dust-contaminated large-area planar plasma source

Journal of Applied Physics

Volumn 86, Issue 5, 1999, Pages 2425-2430

  Ostrikov, K N ^a,c   Yu, M Y ^a   Sugai, H ^b  

^a RUHR UNIVERSITY BOCHUM   (Germany)

^b NAGOYA UNIVERSITY   (Japan)

^c V N KARAZIN KHARKIV NATIONAL UNIVERSITY   (Ukraine)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0013193561     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.371071     Document Type: Article

References (36)

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31. Note that confinement of dust particulates in 2.45 GHz discharges in a sheath near the processed wafer is worse than that in the parallel-plate 13.56 MHz discharges (see, for example, M. D. Kilgore, J. E. Daugherthy, R. K. Porteous, and D. B. Graves, J. Vac. Sci. Technol. B 12, 486 (1994); G. S. Selwyn, K. L. Haller, and E. F. Patterson, Proceedings of the 9th Symposium on Plasma Processing, edited by G. S. Mathad and W. Hess (Electrochemical Society, Pennington, NJ, 1992), p. 132. This may make trapping less likely, and more homogeneous distribution of the dust particles over the entire chamber volume in microwave discharges.
32. Note that confinement of dust particulates in 2.45 GHz discharges in a sheath near the processed wafer is worse than that in the parallel-plate 13.56 MHz discharges (see, for example, M. D. Kilgore, J. E. Daugherthy, R. K. Porteous, and D. B. Graves, J. Vac. Sci. Technol. B 12, 486 (1994); G. S. Selwyn, K. L. Haller, and E. F. Patterson, Proceedings of the 9th Symposium on Plasma Processing, edited by G. S. Mathad and W. Hess (Electrochemical Society, Pennington, NJ, 1992), p. 132. This may make trapping less likely, and more homogeneous distribution of the dust particles over the entire chamber volume in microwave discharges.
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