Growth of particles in cluster-size range in low pressure and low power SiH4 rf discharges

Journal of Applied Physics

Volumn 86, Issue 7, 1999, Pages 3543-3549

  Fukuzawa, Tsuyoshi ^a   Kushima, Shinji ^a   Matsuoka, Yasuhiro ^a   Shiratani, Masaharu ^a   Watanabe, Yukio ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001321929     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.371256     Document Type: Article

References (23)

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