Electron interactions with CHF3

Journal of Physical and Chemical Reference Data

Volumn 26, Issue 1, 1997, Pages 1-15

  Christophorou, L G ^a,b   Olthoff, J K ^a   Rao, M V V S ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b UNIVERSITY OF TENNESSEE   (United States)

Author keywords

Attachment; CHF3; Cross sections; Dissociation; Electron scattering; Emission; Fluoroform; Ionization; Transport; Trifluoromethane

Indexed keywords

COLLISIONAL PLASMAS; DISSOCIATION; ELECTRIC FIELDS; ELECTROMAGNETIC WAVE SCATTERING; ELECTRON SCATTERING; ELECTRON TRANSPORT PROPERTIES; IONIZATION; IONIZATION OF GASES; NEGATIVE IONS; NEUTRON EMISSION; SEMICONDUCTOR DEVICES;

ATTACHMENT; CHF3; CROSS SECTIONS; FLUOROFORMS; TRANSPORT; TRIFLUOROMETHANE;

IMPACT IONIZATION;

EID: 0031539761     PISSN: 00472689     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.556004     Document Type: Article

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