Integrated multi-scale model for ionized plasma physical vapor deposition

Journal of Applied Physics

Volumn 90, Issue 1, 2001, Pages 64-73

  Arunachalam, V ^a   Rauf, S ^a   Coronell, D G ^a,b   Ventzek, P L G ^a  

^a MOTOROLA INC   (United States)

^b Reaction Design   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035397567     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1371279     Document Type: Article

References (23)

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