SCOPUS 정보 검색 플랫폼

Journal of Materials Chemistry

Volumn 12, Issue 5, 2002, Pages 1415-1418

Atomic layer deposition of Al2O3 films using AlCl3 and Al(OiPr)3 as precursors

(3) Räisänen, Petri I a Ritala, Mikko a Leskelä, Markku a

a UNIVERSITY OF HELSINKI (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM OXIDE; SILICON;

ARTICLE; ATOMIC LAYER DEPOSITION; CHEMICAL COMPOSITION; DRY DEPOSITION; ELECTRIC CONDUCTIVITY; FILM; GROWTH RATE; REACTION ANALYSIS; SEMICONDUCTOR; STRUCTURE ANALYSIS; TEMPERATURE DEPENDENCE; X RAY POWDER DIFFRACTION;

EID: 0036092097 PISSN: 09599428 EISSN: None Source Type: Journal
DOI: 10.1039/b201385c Document Type: Article

Times cited : (31)

References (42)

1
- 0001421965
- (1989) Appl. Phys. Lett. , vol.55 , pp. 1963
- Higashi, G.S.¹ Fleming, C.G.²

2
- 0000364381
- (1997) J. Vac. Sci. Technol., A , vol.15 , pp. 2993
- Yun, S.J.¹ Lee, K.-H.² Skarp, J.³ Kim, H.-R.⁴ Nam, K.-S.⁵

3
- 0002572435
- (1992) Thin Solid Films , vol.216 , pp. 84
- Suntola, T.¹

4
- 0030233425
- (1996) Thin Solid Films , vol.286 , pp. 54
- Ritala, M.¹ Saloniemi, H.² Leskelä, M.³ Prohaska, T.⁴ Friedbacher, G.⁵ Grasserbauer, M.⁶

5
- 0006075747
- (1986) Thin Solid Films , vol.142 , pp. 127
- Rajopadhye, N.R.¹ Dake, S.B.² Bhoraskar, V.³

6
- 0022700968
- (1986) Thin Solid Films , vol.138 , pp. 49
- Lux, B.¹ Colombier, C.² Altena, H.³

7
- 0000081968
- (1999) Appl. Phys. Lett. , vol.25 , pp. 4001
- Klein, T.M.¹ Niu, D.² Epling, W.S.³ Li, W.⁴ Maher, D.M.⁵ Hobbs, C.C.⁶ Hedge, R.I.⁷ Baumvol, I.J.R.⁸ Parsons, G.N.⁹

8
- 0029359901
- (1995) Adv. Mater. , vol.8 , pp. 703
- Balk, P.¹

9
- 84990988803
- (1995) J. Non-Cryst. Solids , vol.187 , pp. 1
- Balk, P.¹

10
- 0006092194
- VCH Publishers Inc, New York
- (1995) The Materials Science of Microelectronics , pp. 373
- Bachmann, K.J.¹

11
- 0030291621
- (1996) J. Mater. Res. , vol.11 , pp. 2757
- Hubbard, K.J.¹ Schlom, D.G.²

12
- 0041822817
- (1996) Mater. Sci. Eng., B , vol.41 , pp. 23
- Niinistö, L.¹ Ritala, M.² Leskelä, M.³

13
- 0031546895
- (1997) Appl. Surf Sci. , vol.112 , pp. 223
- Ritala, M.¹

14
- 0031465733
- (1997) Science , vol.278 , pp. 1934
- Klaus, J.W.¹ Sneh, O.² Ott, A.W.³ George, S.M.⁴

15
- 0002747573
- (1995) J. Phys. IV , vol.5 , pp. C5-C937
- Leskelä, M.¹ Ritala, M.²

16
- 0040218501
- (1999) Chem. Vap. Deposition , vol.5 , pp. 7
- Ritala, M.¹ Leskelä, M.² Dekker, J.-P.³ Mutsaers, C.⁴ Soininen, P.J.⁵ Skarp, J.⁶

17
- 0032682630
- (1999) Nanotechnology , vol.10 , pp. 19
- Ritala, M.¹ Leskelä, M.²

18
- 0025683726
- (1990) Acta Polytech. Scand., Chem. Technol. Ser. , vol.195 , pp. 201
- Aarik, J.¹ Aidla, A.² Jaek, A.³ Kiisler, A.-A.⁴ Tammik, A.-A.⁵

19
- 0030737099
- (1997) J. Elecrochem. Soc. , vol.144 , pp. 300
- Kukli, K.¹ Ritala, M.² Leskelä, M.³

20
- 0026204631
- (1991) Mater. Chem. Phys. , vol.28 , pp. 379
- Hiltunen, L.¹ Kattelus, H.² Leskelä, M.³ Mäkelä, M.⁴ Niinistö, L.⁵ Nykänen, E.⁶ Soininen, P.⁷ Tiitta, M.⁸

21
- 0028761992
- (1994) Appl. Surf. Sci. , vol.82-83 , pp. 583
- Drozd, V.E.¹ Baraban, A.P.² Nikiforova, I.O.³

22
- 0031553497
- (1997) Thin Solid Films , vol.292 , pp. 135
- Ott, A.W.¹ Klaus, J.W.² Johnson, J.M.³ George, S.M.⁴

23
- 0000162605
- (2000) Appl. Phys. Lett. , vol.76 , pp. 176
- Gusev, E.P.¹ Copel, M.² Cartier, E.³ Baumvol, I.J.R.⁴ Krug, C.⁵ Gribelyuk, M.A.⁶

24
- 0033739843
- (2000) Thin Solid Films , vol.368 , pp. 1
- Matero, R.¹ Rahtu, A.² Ritala, M.³ Leskelä, M.⁴ Sajavaara, T.⁵

25
- 0027851217
- (1993) Jpn. J. Appl. Phys. , vol.32 , pp. 6137
- Kumagai, H.¹ Toyoda, K.² Matsumoto, M.³ Obara, M.⁴

26
- 0006092821
- (1992) Appl. Surf. Sci. , vol.60-61 , pp. 765
- Fan, J.-F.¹ Toyoda, K.²

27
- 0031150226
- (1997) Microelectron. Eng. , vol.36 , pp. 91
- Ericsson, P.¹ Bengtsson, S.² Skarp, J.³

28
- 0027545547
- (1993) J. Electron. Mater. , vol.22 , pp. 215
- Huang, R.¹ Kitai, A.H.²

29
- 0031503060
- (1997) J. Vac. Sci. Technol., A , vol.15 , pp. 2214
- Kukli, K.¹ Ritala, M.² Leskelä, M.³ Jokinen, J.⁴

30
- 0034646723
- (2000) Science , vol.288 , pp. 319
- Ritala, M.¹ Kukli, K.² Rahtu, A.³ Räisänen, P.I.⁴ Sajavaara, T.⁵ Keinonen, J.⁶

31
- 0001343572
- (1997) Chem. Mater. , vol.9 , pp. 2292
- Vioux, A.¹

32
- 0000126099
- (1992) Chem. Mater. , vol.4 , pp. 961
- Corriou, R.¹ Leqlercq, D.² Lefèrve, P.³ Mutin, P.H.⁴ Vioux, A.⁵

33
- 0001495115
- (1996) J. Mater. Chem. , vol.6 , pp. 1665
- Andrianainarivelo, M.¹ Corriu, R.² Leqlercq, D.³ Mutin, P.H.⁴ Vioux, A.⁵

34
- 0033808389
- (2000) Chem. Mater. , vol.12 , pp. 1914
- Kukli, K.¹ Ritala, M.² Leskelä, M.³

35
- 0006049474
- (2000) Proc. Electrochem. Soc. , vol.2000 , Issue.13 , pp. 623
- Räisänen, P.I.¹ Kukli, K.² Rahtu, A.³ Ritala, M.⁴ Leskelä, M.⁵

36
- 0034853664
- (2001) Chem. Mater. , vol.13 , pp. 1528
- Rahtu, A.¹ Ritala, M.² Leskelä, M.³

37
- 0027659199
- (1993) Thin Solid Films , vol.232 , pp. 56
- Ylilammi, M.¹ Ranta-aho, T.²

38
- 0030284420
- (1996) Thin Solid Films , vol.289 , pp. 250
- Riihelä, D.¹ Ritala, M.² Matero, R.³ Leskelä, M.⁴

39
- 0001188260
- (1992) J. Mater. Chem. , vol.2 , pp. 673
- Corriu, R.J.P.¹ Leclercq, D.² Lefèvre, P.³ Mutin, P.H.⁴ Vioux, A.⁵

40
- 0019875809
- (1981) Thin Solid Films , vol.75 , pp. 105
- Kornyshev, A.A.¹ Vorotyntsev, M.A.²

41
- 0000062057
- (1998) Appl. Phys. Lett. , vol.5 , pp. 632
- Natori, K.¹ Otani, D.² Sano, N.³

42
- 0006050222
- in press
- (2001) Proc. Electrochem. Soc.
- Gusev, E.P.¹ Cartier, E.² Copel, M.³ Gribelyuk, M.⁴ Buchanan, D.A.⁵ Okorn-Schmit, H.⁶ D'Emic, C.⁷ Kozlowski, P.⁸ Tuominen, M.⁹ Linnermo, M.¹⁰ Haukka, S.¹¹

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.