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Advanced Materials

Volumn 13, Issue 12-13, 2001, Pages 877-887

Nanolithography in the evanescent near field

(3) Alkaisi, M M a Blaikie, R J a McNab, S J a

a UNIVERSITY OF CANTERBURY (New Zealand)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DIFFRACTION GRATINGS; ELECTROMAGNETIC FIELD EFFECTS; NANOSTRUCTURED MATERIALS; PHOTORESISTS;

EVANESCENT NEAR FIELD OPTICAL LITHOGRAPHY; NANOSCALE STRUCTURE; PHOTOMASKS;

NANOTECHNOLOGY;

EID: 0035806605 PISSN: 09359648 EISSN: None Source Type: Journal
DOI: 10.1002/1521-4095(200107)13:12/13<877::AID-ADMA877>3.0.CO;2-W Document Type: Article

Times cited : (51)

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