Subwavelength pattern transfer by near-field photolithography

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 12 B, 1998, Pages 6745-6749

  Ono, Takahito ^a   Esashi, Masayoshi ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Atomic force microscope (AFM) lithography; Electron beam lithography; Near field lithography; Subwavelength Pattern Transfer

Indexed keywords

EID: 0000255671     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.6745     Document Type: Article

References (6)

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6. For example, Handbook of Microlithography, Micromachining, and Microfabrication Vol. 1: Microlithography, P. Rai-Choudhury, Bellingham, Washington USA (1997), (SPIE Press).