Printing sub-100 nanometer features near-field photolithography

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 12 B, 1998, Pages 6739-6744

  Tanaka, Shuji ^a   Nakao, Masayuki ^a   Hatamura, Yotaro ^a   Komuro, Masanori ^b   Hiroshima, Hiroshi ^b   Hatakeyama, Masahiro ^c  

^a UNIVERSITY OF TOKYO   (Japan)

^b ELECTROTECHNICAL LABORATORY   (Japan)

^c EBARA CORPORATION   (Japan)

Author keywords

Evanescent light; High resolution; Optical near field; Photolithography; Replication

Indexed keywords

EID: 0004673962     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.6739     Document Type: Article

References (5)

1. Y. Mitsuoka, K. Nakajima, N. Chiba, H. Muramatsu and T. Akata: Ext. Abstr. (58st Autumn Meet., 1997) Japan Society of Applied Physics and Related Societies, 5p-L8 [in Japanese].
2. J. A. Rogers, K. E. Paul, R. J. Jackman and G. M. Whitesides: Appl. Phys. Lett. 70 (1997) 2658.
3. H. Furukawa and S. Kawata: Opt. Commun. 132 (1996) 170.
4. Y. Tohma, M. Hatakeyama, K. Ichiki, H. Huang, K. Yamauchi, K. Watanabe and T. Kato: Jpn. J. Appl. Phys. 36 (1997) 7655.
5. T. Yoshimura, E. W. Scheckler, T. Ogawa, S. Shukuri and H. Shiraishi: Oyo Buturi 63 (1994) 1131 [in Japanese].