Near-field scanning optical nanolithography using amorphous silicon photoresists

Applied Physics Letters

Volumn 74, Issue 1, 1999, Pages 141-143

  Herndon, M K ^a   Collins, R T ^a   Hollingsworth, R E ^b   Larson, P R ^c   Johnson, M B ^c  

^a Department of Geology and Geological Engineering   (United States)

^b Materials Research Group Inc   (United States)

^c UNIVERSITY OF OKLAHOMA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRON MICROSCOPY; GAS LASERS; NANOTECHNOLOGY; OPTICAL MICROSCOPY; OXIDATION; PHOTORESISTS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA ETCHING; SILANES; SILICON WAFERS;

AMORPHOUS SILICON PHOTORESISTS; DITHER AMPLITUDE; NEAR FIELD SCANNING OPTICAL MICROSCOPY; SECONDARY ELECTRON MICROSCOPY;

AMORPHOUS SILICON;

EID: 0033521315     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.122976     Document Type: Article

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