Analytic study of gratings patterned by evanescent near field optical lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 2900-2904

  McNab, S J ^a   Blaikie, R J ^a   Alkaisi, M M ^a  

^a UNIVERSITY OF CANTERBURY   (New Zealand)

Author keywords

[No Author keywords available]

Indexed keywords

COHERENT LIGHT; COMPUTER SIMULATION; DIFFRACTION GRATINGS; INTERFEROMETRY; MASKS; MATHEMATICAL MODELS; OPTICAL RESOLVING POWER;

EVANESCENT NEAR FIELD OPTICAL LITHOGRAPHY (ENFOL); MASK CONDUCTOR EDGES;

PHOTOLITHOGRAPHY;

EID: 0034316296     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1319837     Document Type: Article

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