Diagnostics of an inductively coupled plasma in oxygen

IEEE Transactions on Plasma Science

Volumn 26, Issue 6, 1998, Pages 1724-1732

  Tadokoro, Masahiro ^a,b   Itoh, Akihiko ^a,b   Nakano, Nobuhiko ^a,b   Lj, Zoran ^a,b   Makabe, Toshiaki ^a,b  

^a KEIO UNIVERSITY   (Japan)

^b Shibaura Engineering Works Co Ltd   (Japan)

Author keywords

CT image; Inductively coupled plasma; Plasma ashing; Plasma diagnostics; Radon inversion

Indexed keywords

ANISOTROPY; CARRIER CONCENTRATION; ELECTRIC DISCHARGES; ELECTRON ENERGY LEVELS; EMISSION SPECTROSCOPY; LIGHT EMISSION; OXYGEN; RADON;

AZIMUTHAL ANISOTROPY; INDUCTIVELY-COUPLED PLASMAS (ICP); LANGMUIR PROBES; RADIAL NONUNIFORMITY;

PLASMAS;

EID: 0032312254     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.747892     Document Type: Article

References (42)

1. J. Hopwood, "Review of inductively coupled plasma for plasma processing," Plasma Sources Sci. Technol., vol. 1, pp. 109-116, 1992.
2. J. R. Hollahan, Techniques and Applications of Plasma Chemistry, J. R. Honllahan and A. T. Bell, Eds. New York: Wiley, 1974, p. 229.
3. J. M. Cook and B. W. Benson, "Application of EPR spectroscopy to oxidative removal of organic materials," J. Electrochem. Soc., vol. 130, p. 2459, 1983.
4. D. L. Flamm, Plasma Chem. Plasma Process, vol. 1, p. 37, 1981.
5. R. J. Vidmar, "On the use of atmospheric pressure plasma as electromagnetic reflections and absorbers," IEEE Proc. Plasma Sci., vol. 18, pp. 733-741, 1990.
6. A. V. Gurevich, Sov. Phys. Usp., vol. 23, p. 862, 1980.
7. J. Benford and J. Swegle, "Application of high power microwaves," Proc. IEEE Int. Conf. Plasma Sei, Tampa, FL, 1992, p. 149.
8. N. Nakano, Shimura, Petrovic, and T. Makabe, "Simulations of RF glow discharges in SFe by the relaxation continuum model: Physical structure and function of the narrow-gap reactive-ion etcher," Phys. Rev. E, vol. 49, pp. 4455-44465, 1994.
9. F. Tochikubo, Z. Lj. Petrovic, S. Kakuta, N. Nakano, and T. Makabe, "Influence of Ar metastable on the discharge structure in Ar and N2 mixture in rf discharges at 13.56 MHz," Jpn. J. Appl. Phys., vol. 33, pp. 4271-4275, 1994.
10. M. Shibata, N. Nakano, and T. Makabe, "Effect of 02(3-43) on the plasma structures in oxygen radio frequency discharges,"/ Appl. Phys., vol. 80, pp. 6142-6147, 1996.
11. _, "02 RF discharge structure in parallel plates reactor at 13.56 MHz for material processing," J. Appl. Phys., vol. 77, pp. 6181-6187, 1995.
12. M. Shibata, T. Makabe, and N. Nakano, "A novel sustaining mechanism in capacitively coupled radio frequency plasma in oxygen," Jpn. J. Appl. Phys., vol. 37, pp. 4182-4185, 1998.
13. _, "Effect of surface material on spatiotemporal structure in U2 RF glow discharge," Jpn. J. Appl. Phys., vol. 34, pp. 6230-6236, 1995.
14. V. A. Feoktistov, A. V. Mukhovatova, A. M. Popov, and T. V. Rakhimova, "Self-consistent modeling of low-pressure RF discharges in oxygen plasma," J. Phys. D, vol. 28, pp. 1346-1353, 1995.
15. V. Guerra and J. Loureiro, " Self consistent electron and heavy particle kinetics in a low-pressure N2-U2 glow discharge,"Plasma Sources Sci. Technol., vol. 6, pp. 373-385, 1997.
16. 2 DC flowing glow discharge, J. Phys. D, vol. 28, pp. 738-747, 1995.
17. V. M. Markovic, M. Pejovic, and Z. Lj. Petrovic, "Influence of impurities on surface recombination of nitrogen atoms in late afterglow," Jpn. J. Appl. Phys., vol. 34, pp. 2466-2470, 1995.
18. P. L. G. Ventzek, R. J. Hoekstra, and M. J. Kushner, "Two-dimensional modeling of high plasma density inductively coupled sources for material processing," J. Vac. Sci. Technol. B, vol. 12, pp. 461-4177, 1994.
19. A. P. Paranjpe, "Modeling an inductively coupled plasma source," J. Vac. Sci. Technol. A, vol. 12, pp. 1221-1228, 1994.
20. U. Kortshagen and L. D. Tsendin, "Fast two-dimensional self-consistent kinetic modeling of low-pressure inductively coupled RF discharges," Appl. Phys. Lett., vol. 65, pp. 1355-1357, 1994.
21. K. Kondo, H. Kuroda, and T. Makabe, "Spatiotemporal characteristics determined by a relaxation continuum model of an inductively coupled plasma," Appl. Phys. Lett., vol. 65, pp. 31-33, 1994.
22. _, "A study of the sustaining mechanism in an inductively coupled plasma," Jpn. J. Appl. Phys., vol. 33, pp. 4254-4257, 1994.
23. J. Hopwood, C. R. Guarnieri, S. J. Whitehair, and J. J. Cuomo, "Langmuir probe measurements of a radio frequency induction plasma," J. Vac. Sci. Technol. A, vol. 11, pp. 152-156, 1993.
24. L. J. Mahoney, A. E. Wendt, E. Barrios, C. J. Richards, and J. L. Shohet, "Electron density and energy distributions in a planar inductively coupled discharge," J. Appl. Phys., vol. 76, pp. 2041-2047, 1994.
25. J. A. Meyer and A. E. Wendt, "Measurements of electromagnetic fields in a planar radio-frequency inductively coupled plasma source," J. Appl. Phys., vol. 78, pp. 90-96, 1995.
26. U. Kortshagen, N. D. Gibson, and J. J. Lawler, "On the E-H mode transition in rf inductive discharges," J. Phys. D, vol. 29, pp. 1224-1236, 1996.
27. G. Mumken and U. Kortshagen, "On the radial distribution and nonambipolarity of charged particle fluxed in a nonmagnetic plasma inductively coupled plasma," J. Appl. Phys., vol. 80, pp. 6639-6645, 1996.
28. A. Okigawa, T. Makabe, T. Shibagaki, N. Nakano, Z. L. Petrovic, T. Kogawa, and A. Itoh, "Robot assisted optical emission tomography in an inductively coupled plasma reactor," Jpn. J. Appl. Phys., vol. 35, pp. 1890-1893, 1996.
29. A. Okigawa, Z. Lj. Petrovic, M. Tadokoro, T. Makabe, N. Nakano, and A. Itoh, "Diagnostics of a nonequilibrium inductively coupled plasmas in argon," Appl. Phys. Lett., vol. 69, pp. 2644-2646, 1996.
30. A. Okigawa, M. Tadokoro, A. Itoh, N. Nakano, Z. Lj. Petrovic, and T. Makabe, "Three dimensional optical emission tomography of an inductively coupled plasma," Jpn. J. Appl. Phys., vol. 36, pp. 4605-41616, 1997
31. M. Tadokoro, H. Hirata, N. Nakano, Z. Lj. Petrovic, and T. Makabe, "Time resolved optical emission spectroscopy of an inductively coupled plasma in argon and oxygen," Phys. Rev. E, vol. 57, pp. R43-R46, 1998
32. F. Tochikubo, T. Kokubo, S. Kakuta, A. Suzuki, and T. Makabe, "Investigation of the high-frequency glow discharge in Ar at 13.56 MHz by spatiotemporal optical emission spectroscopy," J. Phys. D, vol. 23, pp. 1184-1192, 1990.
33. 2+CF4 RF discharges by two-photon laser-induced fluorescence and optical emission spectroscopy," J. Chem. Phys., vol. 84, pp. 2668-2674, 1986.
34. J. Bittner, K. Kohse-Hoinghaus, U. Meier, and Th. Just, "Quenching of two-photon-excited H(3s,3d) and O(3p3P2,i,o) atoms by rare gases and small molecules," Chem. Phys. Lett., vol. 143, pp. 571-576, 1988.
35. Z. Lj. Petrovic, F. Tochikubo, S. Kakuta, and T. Makabe, "Spatiotemporal optical emission spectroscopy of RF discharges in SFe," J. Appl. Phys., vol. 73, pp. 2163-2172, 1993.
36. M. J. Kushner, W. Z. Collison, M. J. Grapperhaus, J. P. Holland, and M. S. Barnes, "A three-dimensional model for inductively coupled plasma etching reactors: Azimuthal sysmmetry, coil properties, and comparison to experiments," J. Appl. Phys., vol. 80, pp. 1337-1344, 1996.
37. Z. Lj. Petrovic, S. Bzenic, J. Jovanovic, and S. Djurovic, "On spatial distribution of optical emission in radio frequency discharges," J. Phys. D, vol. 28, pp. 2287-2293, 1995.
38. X. J. Dai, "Kinetic model of an RF discharge in oxygen," Aust. J. Phys., vol. 49, pp. 1169-1180, 1996.
39. D. Pagnon, J. Amorim, J. Nahorny, M. Touzeau, and M. Vialle, "On the use of actinometry to measure the dissociation in U2 DC glow discharges: determination of the wall recombination probability," J. Phys. D, vol. 28, pp. 1856-1868, 1995.
40. A. Wendt, D. F. Beale, W. N. G. Hitchon, E. Keiter, V. Kolobov, L. Mahoney, A. A. Pierre, and J. Stittsworth, "Optical characterization of rf inductively coupled plasma," in Electron Kinetics and Applications of Glow Discharges. New York: Plenum, 1998.
41. P. L. G. Ventzek, M. Grapperhaus, and M. J. Kushner, "Investigation of electron source and ion flux uniformity in high plasma density inductively coupled etching tools using two-dimensional modeling," J. Vac. Sci. Technol. B, vol. 12, pp. 3118-3137, 1994.
42. W. Z. Collison and M. J. Kushner, "Conceptional design of advanced inductively coupled plasma etching tool using computer modeling," IEEE Trans. Plasma Sei, vol. 24, pp. 135-136, 1996.