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Physical Review E

Volumn 49, Issue 5, 1994, Pages 4455-4465

Simulations of rf glow discharges in SF6 by the relaxation continuum model: Physical structure and function of the narrow-gap reactive-ion etcher

(4) Nakano, Nobuhiko a Shimura, Naohiko a Petrović, Zoran Lj a Makabe, Toshiaki a

a KEIO UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000445536 PISSN: 1063651X EISSN: None Source Type: Journal
DOI: 10.1103/PhysRevE.49.4455 Document Type: Article

Times cited : (109)

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