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Volumn 1, Issue 1, 1981, Pages 37-52
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Mechanisms of radical production in CF3Cl, CF3Br, and related plasma etching gases: The role of added oxidants
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Author keywords
formation of etchants; Plasma etching; polymers
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Indexed keywords
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EID: 0002306486
PISSN: 02724324
EISSN: 15728986
Source Type: Journal
DOI: 10.1007/BF00566374 Document Type: Article |
Times cited : (59)
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References (17)
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