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Volumn 1, Issue 1, 1981, Pages 37-52

Mechanisms of radical production in CF3Cl, CF3Br, and related plasma etching gases: The role of added oxidants

Author keywords

formation of etchants; Plasma etching; polymers

Indexed keywords


EID: 0002306486     PISSN: 02724324     EISSN: 15728986     Source Type: Journal    
DOI: 10.1007/BF00566374     Document Type: Article
Times cited : (59)

References (17)
  • 4
    • 84933955961 scopus 로고    scopus 로고
    • D. L. Flamm and D. Butherus, in preparation (1981)
  • 15
    • 84933955960 scopus 로고    scopus 로고
    • C. J. Mogab, unpublished results (1980).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.