Significance of microstructure for a MOCVD-grown YSZ thin film gas sensor

Materials Research Society Symposium - Proceedings

Volumn 403, Issue , 1996, Pages 565-569

  Vetrone, J ^a   Foster, C ^a   Bai, G ^a  

^a ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; ELECTRODES; FABRICATION; IONIC CONDUCTION; LEAKAGE CURRENTS; METALLOGRAPHIC MICROSTRUCTURE; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; TEXTURES; THIN FILMS;

CYCLIC VOLTAGE; ION CONDUCTIVITIES; THIN FILM GAS SENSOR; VOLTAMMOGRAMS;

CHEMICAL SENSORS;

EID: 0030385770     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)