Optical properties and stresses of RF magnetron sputtered yttria-stabilized zirconia thin films

Journal of Materials Science Letters

Volumn 15, Issue 17, 1996, Pages 1513-1516

  Lee, You Kee ^a   Park, Jong Wan ^a  

^a Hanyang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON MICROSCOPY; GLASS; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; SILICON; SPUTTER DEPOSITION; STABILIZATION; STRESSES; THIN FILMS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY; YTTRIUM COMPOUNDS;

OXYGEN CONCENTRATION; RADIO FREQUENCY MAGNETRON SPUTTERING; SUBSTRATE TEMPERATURE; YTTRIA CONCENTRATION; YTTRIA-STABILIZED ZIRCONIA;

ZIRCONIA;

EID: 0030241377     PISSN: 02618028     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF00625008     Document Type: Article

References (5)

1. G. JOHNER and J. K. SCHWEITZER, Thin Solid Films 119 (1984) 301.
2. E. C. SUBBARAO and H. S. MAITI in Science and Technology of Zirconia III, Vol. 24B, edited by S. Sömiya, N. Yamamoto and H. Hanagida (The American Ceramic Society, Westerville, Ohio, 1988) p. 731.
3. S. A. BARNETT, Energy 15 (1990) 1.
4. R. RUJKORAKARN and J. R. SITES, J. Vac. Sci. Technol. A 4 (1986) 568.
5. R. W. KNOLL and E. R. BARDLEY, Mater. Res. Soc. Symp. Proc. 30 (1984) 235.