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Chemical Vapor Deposition

Volumn 5, Issue 6, 1999, Pages 265-273

Low-pressure CVD of carbon nitride using triazine-containing precursors

(6) Ivanov, Borislav L a Zambov, Ludmil M a Georgiev, Georgy T a Popov, Cyril b Plass, Martin F b Kulisch, Wilhelm b

a UNIVERSITY OF CHEMICAL TECHNOLOGY AND METALLURGY (Bulgaria)

b UNIVERSITY OF KASSEL (Germany)

Author keywords

Carbon nitride; Organic LPCVD; Triazine precursors

Indexed keywords

EID: 0000237461 PISSN: 09481907 EISSN: None Source Type: Journal
DOI: 10.1002/(SICI)1521-3862(199912)5:6<265::AID-CVDE265>3.0.CO;2-N Document Type: Article

Times cited : (26)

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