Nitrogen-ion irradiation during the deposition of C1-xNx thin films by ion beam sputtering technique

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 3, 1996, Pages 777-780

  Kobayashi, Satoshi ^a   Miyazaki, Keiko ^a   Nozaki, Shinji ^a   Morisaki, Hiroshi ^a   Fukui, Shigeo ^b   Masaki, Susumu ^b  

^a UNIVERSITY OF ELECTRO COMMUNICATIONS   (Japan)

^b TOKYO NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000861246     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580388     Document Type: Article

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