Incorporation of nitrogen in sputtered carbon films

Surface and Coatings Technology

Volumn 81, Issue 2-3, 1996, Pages 262-268

  Axen N ^a   Botton, G A ^a   Lou, H Q ^a   Somekh, R E ^a   Hutchings, I M ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

Carbon nitride; Sputter deposition; Thin films

Indexed keywords

AMORPHOUS FILMS; CARBON; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRON MICROSCOPY; HARDNESS; ION BOMBARDMENT; MAGNETRON SPUTTERING; NITROGEN; RUTHERFORD BACKSCATTERING SPECTROSCOPY; STRESSES; SUBSTRATES; THIN FILMS;

CARBON FILMS; CARBON NITRIDE;

SPUTTER DEPOSITION;

EID: 0030170029     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/0257-8972(95)02534-0     Document Type: Article

References (17)

1. D.I. Jones and A.D. Stewart, Philos. Mag. B, 46, (1982) 423-434.
2. J.J. Cuomo, P.A. Leary, D. Yu, W. Reuter and M. Frisch, J. Vac. Sci. Technol., 16 (1979) 299-302.
3. A.Y. Liu and M.L. Cohen, Science, 245 (1989) 841-843.
4. A.Y. Liu and M.L. Cohen, Phys. Rev. B, 4, (1990) 10727-10734.
5. J. Hoggin, Chem. Eng. News, May 25 (1992) 20.
6. L. Maya, D.R. Cole and E.W. Hagaman, J. Am. Ceram. Soc., 74 (1991) 1686-1688.
7. M.Y. Chen, X. Lin, V.P. Dravid, Y.W. Chung, M.S. Wong and W.D. Sproul, Surf. Coat. Technol., 54/55 (1992) 360-364.
8. N. Nakayama, Y. Tsuchiya, S. Tamada, K. Kosuge, S. Nagata, K. Takahiro and S. Yamaguchi, J. Appl. Phys., 32 (1993) L1465-L1468.
9. C. Niu, Y.Z. Lu and C.M. Lieber, Science, 261 (1993) 334-337.
10. J. Seth, R. Padiyath and S.V. Babu, Diamond Relat. Mater., 3 (1994) 210-221.
11. J. Schwan, W. Dworschak, K. Jung and H. Ehrhardt, Diamond Relat. Mater., 3 (1994) 1034-1039.
12. D.C. Green, D.R. McKenzie and P.B. Lukins, Mater. Sci. Forum, 52/53 (1989) 103-124.
13. J. Robertson and C.A. Davis, Diamond Relat. Mater. (1995) in press.
14. S.D. Berger, D.R. McKenzie and P.J. Martin, Philos. Mag. Lett., 57 (1988) 285-290.
15. C.C. Ahn and O.L. Krivanek, EELS Atlas, Gatan Inc., Warrendale, PA.
16. D. Li, Y.-W. Chung, M.-S. Wong and W.D. Sproul, J. Appl. Phys., 74 (1993) 219-223.
17. H. Sjöström, I. Ivanov, M. Johansson, L. Hultman, J.-E. Sundgren, S.V. Hainsworth, T.F. Page and L.R. Wallenberg, Thin Solid Films, 246 (1994) 103-109.