Thin CNx films prepared by vacuum rapid thermal annealing

Vacuum

Volumn 51, Issue 2, 1998, Pages 169-172

  Beshkov, G ^a   Dimitrov, D B ^a   Georgiev, St ^a   Petrov, P ^b   Zambov, L ^c   Ivanov, B ^c   Popov, C ^d   Georgiev, M ^c  

^a INSTITUTE OF SOLID STATE PHYSICS   (Bulgaria)

^b INSTITUTE OF ELECTRONICS   (Bulgaria)

^c UNIVERSITY OF CHEMICAL TECHNOLOGY AND METALLURGY   (Bulgaria)

^d CENTRAL LABORATORY OF PHOTOPROCESSES   (Bulgaria)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CARBON INORGANIC COMPOUNDS; ELECTRIC INSULATING MATERIALS; ELECTRIC RESISTANCE; FILM PREPARATION; MAGNETRON SPUTTERING; NITRIDES; NITROGEN; PLASMA ETCHING; RAPID THERMAL ANNEALING; SILICON SENSORS; SPUTTER DEPOSITION;

CARBON NITRIDE;

THIN FILMS;

EID: 0032182450     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(98)00152-3     Document Type: Article

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