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Thin Solid Films

Volumn 281-282, Issue 1-2, 1996, Pages 289-293

Carbon nitride thin films deposited by the reactive ion beam sputtering technique

(5) Kobayashi, Satoshi a Nozaki, Shinji a Morisaki, Hiroshi a Fukui, Shigeo b Masaki, Susumu b

a UNIVERSITY OF ELECTRO COMMUNICATIONS (Japan)

b TOKYO NATIONAL COLLEGE OF TECHNOLOGY (Japan)

Author keywords

Carbon; Deposition process; Nitrides; Sputtering

Indexed keywords

ABSORPTION SPECTROSCOPY; BAND STRUCTURE; CARBON; CHEMICAL BONDS; INFRARED SPECTROSCOPY; ION BEAMS; ION BOMBARDMENT; NITRIDES; RAMAN SPECTROSCOPY; SPUTTER DEPOSITION; SUBSTRATES; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS NETWORK; CARBON NITRIDE; CONJUGATED DOUBLE BONDS; REACTIVE ION BEAM SPUTTERING;

THIN FILMS;

EID: 0030219231 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/0040-6090(96)08655-5 Document Type: Article

Times cited : (51)

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