Pulsed laser deposition and physical properties of carbon nitride thin films

Journal of Electronic Materials

Volumn 25, Issue 1, 1996, Pages 57-61

  Zhang, Z John ^a   Fan, Shoushan ^a   Huang, Jinlin ^a   Lieber, Charles M ^a  

^a HARVARD UNIVERSITY   (United States)

Author keywords

Carbon nitride; Pulsed laser deposition; Thin films

Indexed keywords

CARBON INORGANIC COMPOUNDS; DEPOSITION; ELECTRIC CONDUCTIVITY; INFRARED SPECTROSCOPY; LASER ABLATION; LASER APPLICATIONS; PHYSICAL PROPERTIES; THERMAL CONDUCTIVITY; THIN FILMS;

ATOMIC BEAM TECHNIQUES; CARBON NITRIDES; ELECTRICAL RESISTIVITY; PULSED LASER DEPOSITION;

NITRIDES;

EID: 0029679220     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF02666174     Document Type: Article

References (24)

1. W. Schnick, Angew. Chem. Int. Ed. Engl. 32, 1580 (1993).
2. C.M. Lieber and Z.J. Zhang, Adv. Mater. 6, 497 (1994).
3. A.Y. Liu and M.L. Cohen, Science 245, 841 (1989); A.Y. Liu and M.L. Cohen, Phys. Rev. B 41, 10727 (1990).
4. A.Y. Liu and M.L. Cohen, Science 245, 841 (1989); A.Y. Liu and M.L. Cohen, Phys. Rev. B 41, 10727 (1990).
5. C. Niu, Y.Z. Lu and C.M. Lieber, Science 261, 334 (1993).
6. F. Xiong, R.P.H. Chang and C.W. White, Mater. Res. Symp. Proc. 285, 587 (1993).
7. J. Narayan, J. Reddy, N. Biunno, S.M. Kanetkar, P. Tiwari and N. Parikh, Mater. Sci. Eng. B 26, 49 (1994).
8. M.Y. Ming, X. Lin, V.P. Dravid, Y.-W. Chung, M.S. Wong and W.D. Sproul, Surf. Coating Technol. 54/55, 360 (1992); M.Y. Chen, D. Li, X. Lin, V.P. Dravid, Y.-W. Chung, M.-S. Wong and W.D. Sproul, J. Vac. Sci. Technol. A 11, 521 (1993).
9. M.Y. Ming, X. Lin, V.P. Dravid, Y.-W. Chung, M.S. Wong and W.D. Sproul, Surf. Coating Technol. 54/55, 360 (1992); M.Y. Chen, D. Li, X. Lin, V.P. Dravid, Y.-W. Chung, M.-S. Wong and W.D. Sproul, J. Vac. Sci. Technol. A 11, 521 (1993).
10. P.G. Kosky, R.H. Wilson and M.F. Carbauskas, G. E. Res. & Dev. Reports No. 93CRD109 (1993).
11. K.M. Yu, M.L. Cohen, E.E. Haller, W.L. Hansen, A.Y. Liu and I.C. Wu, Phys. Rev. B 49, 5034 (1994).
12. H.-X. Han and B. Feldman, Solid State Commun. 65, 921 (1988); M.R. Wixom, J. Am. Ceram. Soc. 73, 1973 (1990); L. Maya, D.R. Cole and E.W. Hagaman, J. Am. Ceram. Soc. 74, 1686 (1991).
13. H.-X. Han and B. Feldman, Solid State Commun. 65, 921 (1988); M.R. Wixom, J. Am. Ceram. Soc. 73, 1973 (1990); L. Maya, D.R. Cole and E.W. Hagaman, J. Am. Ceram. Soc. 74, 1686 (1991).
14. H.-X. Han and B. Feldman, Solid State Commun. 65, 921 (1988); M.R. Wixom, J. Am. Ceram. Soc. 73, 1973 (1990); L. Maya, D.R. Cole and E.W. Hagaman, J. Am. Ceram. Soc. 74, 1686 (1991).
15. A.Y. Liu and R.M. Wentzcovitch, Phys. Rev. B 50, 10362 (1994).
16. J.E. Pollard, Rev. Sci. Instrum. 63, 1771 (1992); S.J. Sibener, R.J. Buss, C.Y. Ng and Y.T. Lee, ibid 51, 167 (1980).
17. J.E. Pollard, Rev. Sci. Instrum. 63, 1771 (1992); S.J. Sibener, R.J. Buss, C.Y. Ng and Y.T. Lee, ibid 51, 167 (1980).
18. J.T. Cheung and H. Sankur, CRC Crit. Rev. Solid State Mater. Sci. 15, 63 (1988).
19. J. Kouvetakis, A. Bandari, M. Todd, B. Wilkens and N. Cave, Chem. Mater. 6, 811 (1994).
20. J.J. Cuomo, P.A. Leary, D. Yu, W. Reuter and M. Frisch, J. Vac. Sci. Technol. 16, 299 (1979).
21. J. Robertson, Surf. Coating Technol. 50, 185 (1992).
22. D.G. Cahill, Rev. Sci. Instrum. 61, 802 (1990).
23. D.G. Cahill and T.H. Allen, Appl. Phys. Lett. 65, 309 (1994).
24. C.J. Morath, H.J. Maris, J.J. Cuomo, D.L. Pappas, A. Grill, V.V. Patel, J.P. Doyle and K.L. Saenger, J. Appl. Phys. 76, 2636 (1994).