Dry-etching resistance of fluoropolymers for 157-nm single-layer resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5039 I, Issue , 2003, Pages 43-52

  Kawaguchi, Yasuhide ^a   Irisawa, Jun ^a   Kodama, Shun Ichi ^a   Okada, Shinji ^a   Takebe, Yoko ^a   Kaneko, Isamu ^a   Yokokoji, Osamu ^a   Ishikawa, Seiichi ^b   Irie, Shigeo ^b   Hagiwara, Takuya ^b   Itani, Toshiro ^b  

^a ASAHI GLASS CO LTD   (Japan)

^b SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

157nm lithography; Cyclo polymerization; Dry etching resistance; Fluoropolymer; Photoresist; Protective group

Indexed keywords

ADHESION; DEGASSING; DRY ETCHING; FLUORINE CONTAINING POLYMERS; FREE RADICAL POLYMERIZATION; PHOTOSENSITIVITY; SYNTHESIS (CHEMICAL); TRANSPARENCY;

DRY ETCHING RESISTANCE; RADICAL CYCLO-POLYMERIZATION;

PHOTORESISTS;

EID: 0141611837     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.483735     Document Type: Conference Paper

References (14)

1. Toriumi, Naomi Shida, Hiroyuki Watanabe, Tamio Yamazaki, Seiichi Ishikawa and Toshiro Itani, Proc. SPIE, vol. 4690, p191 (2002).
2. Shun-ichi Kodama, Isamu Kaneko, Yoko Takebe, Shinji Okada, Yasuhide Kawaguchi, Naomi Shida, Seiichi Ishikawa, Minoru Toriumi and Toshiro Itani, Proc. SPIE, vol. 4690, p76 (2002).
3. Naomi Shida, Hiroyuki Watanabe, Tamio Yamazaki, Seiichi Ishikawa, Minoru Toriumi and Toshiro Itani, Proc. SPIE, vol. 4690, p497 (2002).
4. F. M. Richards, Ann. Rev. Biophys. Bioeng., 6, p151 (1977).
5. J.L. Pascual-Ahuir, E.Silla, I.Tunon, J.Comp.Chem. 15, p1127 (1994).
6. A. Warshawsky, A. Deshe, R. Gutman, British Polymer Journal, 16, p234 (1984).
7. T. W. Greene and P. G. M. Wuts, "Protective Groups in Organic Synthesis", John Wiley & Sons, Inc., N.Y. (1999).
8. H. Gokan et al., J. Electrochem. Soc., vol. 130, p143 (1983).
9. R. R. Kunz et al., Proc. SPIE, vol. 2724, p365 (1996).
10. T. Ohfuji et al., Proc. SPIE, vol. 3333, p595 (1998).
11. S. Kishimura et al., Proc. SPIE, vol. 4690, p200 (2002).
12. M. Koh et al., Proc. SPIE, vol. 4690, p486 (2002).
13. China-Yuh Sin et al., J. Vac. Sci. Technol. B 20(5), p1974 (2002).
14. S. Imai, J. Vac. Sci. Technol. B 20(4), p1482 (2002).