Rejuvenation of 248 nm resist backbones for 157 nm lithography

Journal of Photopolymer Science and Technology

Volumn 14, Issue 4, 2001, Pages 613-620

  Bae, Young C ^a   Douki, Katsuji ^a   Yu, Tianyue ^a   Dai, Junyan ^a   Schmaljohann, Dirk ^a   Kang, Seok Ho ^a   Kim, Keon Hyeong ^a   Koerner, Hilmar ^a   Conley, Will ^b   Miller, Daniel ^b   Balasubramanian, Raghu ^c   Holl, Susan ^c   Ober, Christopher K ^a  

^a Department of Obstetrics Gynecology   (United States)

^b International SEMATECH   (United States)

^c INTEL CORPORATION   (United States)

Author keywords

157 nm resists; Fluorocarbinol; Transparency enhancers

Indexed keywords

ACRYLIC ACID DERIVATIVE; COPOLYMER; FLUORINE DERIVATIVE; MONOMER; STYRENE DERIVATIVE;

ABSORPTION SPECTROSCOPY; ARTICLE; CARBON NUCLEAR MAGNETIC RESONANCE; FLUORINATION; LITHOGRAPHY; POLYMERIZATION; PROTON NUCLEAR MAGNETIC RESONANCE; SCANNING ELECTRON MICROSCOPY; SYNTHESIS;

EID: 0035747121     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.14.613     Document Type: Article

References (11)