Aliphatic platforms for the design of 157 nm chemically amplified resists

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4690 I, Issue , 2002, Pages 18-28

  Ito, Hiroshi ^a   Truong, Hoa D ^a   Okazaki, Masaki ^a   Miller, Dolores C ^a   Fender, Nicolette ^a   Breyta, Gregory ^a   Brock, Phillip J ^a   Wallraff, Gregory M ^a   Larson, Carl E ^a   Allen, Robert D ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

157 nm lithography; 2 trifluoromethylacrylate; Chemical amplification; Copolymerization kinetics; Dissolution kinetics; Hexafluoroisopropanol; Penultimate model; Quartz crystal microbalance; Radical copolymerization; Reactivity ratios; Terminal model

Indexed keywords

BLENDING; COPOLYMERIZATION; COPOLYMERS; DENSITY (OPTICAL); DERIVATIVES; HYDROPHILICITY; MONOMERS; OPTICAL RESOLVING POWER;

CHEMICAL AMPLIFICATION;

PHOTOLITHOGRAPHY;

EID: 0141654754     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474223     Document Type: Article

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