Advances in TFE based fluoropolymers for 157nm lithography: A progress report

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5039 I, Issue , 2003, Pages 33-42

  Sharif, Iqbal ^a   DesMarteau, Darryl ^a   Ford, Larry ^a   Shafer, Greg ^a   Thomas, Brian ^a   Conley, Will ^b   Zimmerman, Paul ^b   Miller, Daniel ^b   Lee, Guen Su ^b   Chambers, Charles ^c   Trinque, Brian ^c   Chiba, Takashi ^c   Osborn, Brian ^c   Willson, C Grant ^c  

^a CLEMSON UNIVERSITY   (United States)

^b SEMATECH   (United States)

^c The University of Texas at Austin   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON MONOXIDE; COPOLYMERIZATION; ELLIPSOMETRY; ETCHING; FREE RADICAL POLYMERIZATION; MONOMERS; POLYTETRAFLUOROETHYLENES; SPECTROSCOPY; SYNTHESIS (CHEMICAL);

METAL-CATALYZED ADDITION POLYMERIZATION; METAL-CATALYZED COPOLYMERIZATION; TETRAFLUOROETHYLENE; VARIABLE ANGLE SPECTROSCOPIC ELLIPSOMETRY;

PHOTORESISTS;

EID: 0141611839     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485192     Document Type: Conference Paper

References (0)