157 nm resist materials: A progress report

Journal of Photopolymer Science and Technology

Volumn 13, Issue 4, 2000, Pages 657-664

  Chiba, Takashi ^a   Hung, Raymond J ^a   Yamada, Shintaro ^a   Trinque, Brian ^a   Yamachika, Miko ^a   Brodsky, Colin ^a   Patterson, Kyle ^a   Heyden, Anthony Vander ^a   Jamison, Andrew ^a   Lin, Shang Ho ^a   Somervell, Mark ^a   Byers, Jeffrey ^b   Conley, Will ^b   Grant Willson, C ^a  

^a The University of Texas at Austin   (United States)

^b SEMATEC ^*

Author keywords

157nm Resists; 2 (trifluromethyl)acrylates; Chemically amplified resist; Fluoronorbornanes

Indexed keywords

ACRYLIC ACID COPOLYMER; BICYCLO COMPOUND; CARBONYL DERIVATIVE; FLUORINE; FLUOROCARBON; GLASS; METAL; METHYL GROUP; NORBORNANE DERIVATIVE; POLYMER;

ARTICLE; CATALYSIS; CHEMICAL MODIFICATION; CHEMICAL STRUCTURE; ELECTRON; GAS; HALOGENATION; MATERIALS; POLYMERIZATION; SYNTHESIS; TECHNOLOGY; ULTRAVIOLET SPECTROSCOPY; VACUUM;

EID: 0034584791     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.13.657     Document Type: Article

References (14)