Effect of fluorinated monomer unit introduction to KrF resin system in F2 lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4345, Issue I, 2001, Pages 379-384

  Uetani, Y ^a   Hashimoto, K ^a   Miya, Y ^a   Yoshida, I ^a   Takigawa, M ^a   Hanawa, R ^a  

^a SUMITOMO CHEMICAL CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DRY ETCHING; FLUORINE CONTAINING POLYMERS; LIGHT TRANSMISSION; MOLECULAR STRUCTURE; MONOMERS; RESINS;

FLUORINATED MONOMER;

LITHOGRAPHY;

EID: 0034768329     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436869     Document Type: Conference Paper

References (4)