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Lithography with 157 nm lasers
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2
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0032675485
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Outlook for 157 nm resist design
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R. R. Kunz, T. M. Bloomstein, D. E. Hardy, R. B. Goodman, D.K. Downs, and J. E. Curtin, "Outlook for 157 nm resist design", Proc. SPIE Vol.3678, 13 (1999)
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3
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0034768329
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Effect of fluorinated monomer unit introduction to KrF resin system in F2 lithography
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0033708240
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Prospects for using existing resists for evaluating 157 nm imaging systems
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T. H. Fedynyshyn, R. R. Kunz, S. O. Doran, R. B. Goodman, M. L. Lind, and J. E. Curtin, "Prospects for using existing resists for evaluating 157 nm imaging systems", Proc. SPIE Vol. 3999, 335 (2000).
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5
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0034315298
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Vacuum ultraviolet spectra of fluorocompounds for 157 nm lithography
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M. Toriumi, I. Satoh and T. Itani, "Vacuum ultraviolet spectra of fluorocompounds for 157 nm lithography", J. Vac. Sci. Technol. B18, 3328 (2000).
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Toriumi, M.1
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6
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Fluoropolymer resists for 157-nm lithography
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M. Toriumi, N. Shida, H. Watanabe, T. Yamazaki, S. Ishikawa and T. Itani, "Fluoropolymer resists for 157-nm lithography", Proc. SPIE Vol. 4690, 191 (2002).
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7
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0036031304
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Synthesis of novel fluoropolymer for 157 photoresists by cyclo-polymerization
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S. Kodama, I. Kaneko, Y. Takabe, S. Okada, Y. Kawaguchi, N. Shida, S. Ishikawa, M. Toriumi, T. Itani, "Synthesis of novel fluoropolymer for 157 photoresists by cyclo-polymerization", Proc. SPIE Vol. 4690, 76 (2002).
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8
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0035747030
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Resist property of fluoropolymer for 157 nm lithography
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S. Ishikawa, M. Toriumi, S. Miyoshi, T. Naito, T. Yamazaki, M. Watanabe and T. Itani, "Resist property of fluoropolymer for 157 nm lithography", J. Photopolymer Sci. Technol., 14, 595 (2001).
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9
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0035747121
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Rejuvenation of 248 nm resist backbones for 157 nm lithography
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Y.-C. Bae, K. Douki, T. Yu, J. Dai, D. Schmaljohann, S.-H. Kang, K.-H. Kim, H. Koerner, W. Conley, D. Miller, R. Balasubramanian, S. Holl and C. K. Ober, "Rejuvenation of 248 nm resist backbones for 157 nm lithography", J. Photopolymer Sci. Technol., 14, 613 (2001).
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Bae, Y.-C.1
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10
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0034768690
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157 nm imaging using thick single layer resists
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M. K. Crawford, A. E. Feiring, J. Feldman, R. H. French, V. A. Petrov, F. L. Shadt III, R. J. Smalley and F. C. Zumsteg, "157 nm imaging using thick single layer resists", Proc. SPIE Vol. 4345, 428 (2001).
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11
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17944368287
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Resist materials for 157 nm microlithography : An update
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R. J. Hung, H. V. Tran, B. C. Trinque, T. Chiba, S. Yamada, D. P. Sanders, E. F. Connor, R. H. Grubbs, J. Klopp, J. M. J. Frechet, B. H. Thomas, G. J. Shafer, D. D. DesMarteau, W. Conley and G. Willson, "Resist materials for 157 nm microlithography : An update", Proc. SPIE Vol. 4345, 385 (2001).
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12
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0035746838
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Novel fluoropolymers for use in 157 nm lithography
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H. Ito, G. M. Wallraff, N. Fender, P. J. Brock, C. E. Larson, H. D. Truong, G. Breyta, D. C. Miller, M. H. Sherwood, and R. D. Allen, "Novel fluoropolymers for use in 157 nm lithography", J. Photopolymer Sci. Technol., 14, 583 (2001).
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13
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0036029117
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The study on dry etch resistance of fluorine functionalized polymers
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M. Koh, T. Ishikawa, T. Araki, H. Aoyama, T. Yamashita, T. Yamazaki, H. Watanabe, M. Toriumi and T. Itani, "The study on dry etch resistance of fluorine functionalized polymers", Proc. SPIE Vol. 4690, 486 (2002).
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14
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Theoretical calculations of photoabsorption of several alicyclic molecules in the vacuum ultraviolet region
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N. Matsuzawa, A. Ishitani, D. A. Dixon, and T. Uda, "Theoretical calculations of photoabsorption of several alicyclic molecules in the vacuum ultraviolet region", Proc. SPIE Vol. 4345, 396 (2001).
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Matsuzawa, N.1
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15
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Development of 157 nm resist by using highly exact theoretical calculation of absorption spectra
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T. Yamazaki and T. Itani, "Development of 157 nm resist by using highly exact theoretical calculation of absorption spectra", Jpn. J. Appl. Phys., Part 1, 38, 7103-7108 (2002).
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Yamazaki, T.1
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16
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0034315298
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Vacuum ultraviolet spectra of fluorocompounds for 157 nm lithography
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M. Toriumi, I. Satoh and T. Itani, "Vacuum ultraviolet spectra of fluorocompounds for 157 nm lithography", J. Vac. Sci. Technol. B18, 3328-3331 (2000).
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Toriumi, M.1
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17
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0035746843
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New resin systems for 157 nm lithography
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R. R. Dammel, R. Sakamuri, T. Kudo, A. Romano, L. Rhodes, R. Vicari, C. Haker, W. Conley and D. Miller, "New resin systems for 157 nm lithography", J. Photopolymer Sci. Technol., 14, 603 (2001).
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