메뉴 건너뛰기




Volumn 5039 I, Issue , 2003, Pages 589-599

Synthesis of novel fluorinated norbornene derivatives for 157 nm application

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; COPOLYMERIZATION; FLUORINE; FLUORINE COMPOUNDS; FLUORINE CONTAINING POLYMERS; MATHEMATICAL MODELS; MONOMERS; PHOTORESISTS; SOLUBILITY; SYNTHESIS (CHEMICAL); TRANSPARENCY;

EID: 0141834703     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485077     Document Type: Conference Paper
Times cited : (16)

References (17)
  • 3
    • 0034768329 scopus 로고    scopus 로고
    • Effect of fluorinated monomer unit introduction to KrF resin system in F2 lithography
    • Y. Uetani, K. Hashimoto, Y. Miya, I. Yoshida, M. Takigawa and R. Hanawa, "Effect of fluorinated monomer unit introduction to KrF resin system in F2 lithography", Proc. SPIE Vol. 4345, 379 (2001).
    • (2001) Proc. SPIE , vol.4345 , pp. 379
    • Uetani, Y.1    Hashimoto, K.2    Miya, Y.3    Yoshida, I.4    Takigawa, M.5    Hanawa, R.6
  • 5
    • 0034315298 scopus 로고    scopus 로고
    • Vacuum ultraviolet spectra of fluorocompounds for 157 nm lithography
    • M. Toriumi, I. Satoh and T. Itani, "Vacuum ultraviolet spectra of fluorocompounds for 157 nm lithography", J. Vac. Sci. Technol. B18, 3328 (2000).
    • (2000) J. Vac. Sci. Technol. , vol.B18 , pp. 3328
    • Toriumi, M.1    Satoh, I.2    Itani, T.3
  • 14
    • 0034757362 scopus 로고    scopus 로고
    • Theoretical calculations of photoabsorption of several alicyclic molecules in the vacuum ultraviolet region
    • N. Matsuzawa, A. Ishitani, D. A. Dixon, and T. Uda, "Theoretical calculations of photoabsorption of several alicyclic molecules in the vacuum ultraviolet region", Proc. SPIE Vol. 4345, 396 (2001).
    • (2001) Proc. SPIE , vol.4345 , pp. 396
    • Matsuzawa, N.1    Ishitani, A.2    Dixon, D.A.3    Uda, T.4
  • 15
    • 26544465061 scopus 로고    scopus 로고
    • Development of 157 nm resist by using highly exact theoretical calculation of absorption spectra
    • T. Yamazaki and T. Itani, "Development of 157 nm resist by using highly exact theoretical calculation of absorption spectra", Jpn. J. Appl. Phys., Part 1, 38, 7103-7108 (2002).
    • (2002) Jpn. J. Appl. Phys., Part 1 , vol.38 , pp. 7103-7108
    • Yamazaki, T.1    Itani, T.2
  • 16
    • 0034315298 scopus 로고    scopus 로고
    • Vacuum ultraviolet spectra of fluorocompounds for 157 nm lithography
    • M. Toriumi, I. Satoh and T. Itani, "Vacuum ultraviolet spectra of fluorocompounds for 157 nm lithography", J. Vac. Sci. Technol. B18, 3328-3331 (2000).
    • (2000) J. Vac. Sci. Technol. B , vol.18 , pp. 3328-3331
    • Toriumi, M.1    Satoh, I.2    Itani, T.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.