Design of very transparent fluoropolymer resists for semiconductor manufacture at 157 nm

Journal of Fluorine Chemistry

Volumn 122, Issue 1, 2003, Pages 11-16

  Feiring, Andrew E ^a   Crawford, M K ^a   Farnham, W B ^a   Feldman, J ^a   French, R H ^a   Leffew, K W ^a   Petrov, V A ^a   Schadt III, F L ^a   Wheland, R C ^a   Zumsteg, F C ^a  

^a DUPONT COMPANY   (United States)

Author keywords

Fluorinated alcohols; Photolithography; Tetrafluoroethylene copolymers; Transparent fluoropolymers

Indexed keywords

ACRYLIC ACID DERIVATIVE; ALCOHOL DERIVATIVE; ALKENE DERIVATIVE; ESTER DERIVATIVE; FLUORINE DERIVATIVE; FREE RADICAL; POLYMER; TETRAFLUOROETHYLENE;

ARTICLE; CONTROLLED STUDY; ELECTRONICS INDUSTRY; PHOTOCHEMISTRY; PHYSICAL CHEMISTRY; POLYMERIZATION; SEMICONDUCTOR; SPECTRAL SENSITIVITY; SYNTHESIS; WEIGHT;

EID: 0037633572     PISSN: 00221139     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-1139(03)00075-7     Document Type: Article

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