High resolution fluorocarbon based resist for 157-nm lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4345, Issue I, 2001, Pages 296-307

  Fedynyshyn, T H ^a   Kunz, R R ^a   Sinta, R F ^a   Sworin, M ^a   Mowers, W A ^a   Goodman, R B ^a   Doran, S P ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

157 nm wavelength; Absorbance; Fluoropolymer; Lithography; Plasma etching; Resist

Indexed keywords

FLUORINE CONTAINING POLYMERS; IMAGE ANALYSIS; LIGHT ABSORPTION; NANOTECHNOLOGY; OPTICAL RESOLVING POWER; PLASMA ETCHING; POLYACRYLATES;

MICROSTEPPERS;

PHOTORESISTS;

EID: 0034763292     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436859     Document Type: Conference Paper

References (26)