Structure of electroless deposited Co0.9W0.02P 0.08 thin films and their evolution with thermal annealing

Journal of Applied Physics

Volumn 94, Issue 6, 2003, Pages 3810-3822

  Kohn, A ^a   Eizenberg, M ^a   Shacham Diamand, Y ^b  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

^b TEL AVIV UNIVERSITY   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; COBALT; COBALT COMPOUNDS; CRYSTALLIZATION; DIFFUSION; ELECTROLESS PLATING; ENCAPSULATION; GRAIN BOUNDARIES; MICROELECTRONICS; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; NUCLEATION; PHASE TRANSITIONS; RAPID THERMAL ANNEALING; SOLID SOLUTIONS;

DIFFUSION BARRIERS;

THIN FILMS;

EID: 0141921436     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1602572     Document Type: Article

References (49)

1. SIA International Technology Roadmap for Semiconductors (Semiconductor Industry Association, San Jose, CA, 2001).
2. A. Kohn et al., Microelectron. Eng. 55, 297 (2001).
3. A. Kohn et al., J. Appl. Phys. 92, 5508 (2002).
4. C.-K. Hu et al., Appl. Phys. Lett. 81, 1782 (2002).
5. T. Chen et al., J. Appl. Phys. 49, 1816 (1978).
6. T. Osaka et al., J. Electrochem. Soc. 130, 790 (1983).
7. M. Mirzamaani et al., J. Electrochem. Soc. 135, 2813 (1988).
8. M. Schlesinger et al., J. Electrochem. Soc. 137, 1706 (1990).
9. M. Paunovic et al., J. Electrochem. Soc. 141, 1843 (1994).
10. E. J. O'Sullivan et al., IBM J. Res. Dev. 42, 607 (1998).
11. K. Hüller, M. Sydow, and G. Dietz, J. Magn. Magn. Mater. 53, 269 (1985).
12. U. Admon, A. Bar-Or, and D. Treves, J. Appl. Phys. 44, 2300 (1973).
13. R. O. Cortijo, and M. Schlesinger, J. Electrochem. Soc. 131, 2800 (1984).
14. R. Sonnberger and G. Dietz, Rapidly Quenched Metals, edited by S. Steeb and H. Warlimont (North-Holland, Amsterdam, 1985), p. 703.
15. F. Cebollada and J. M. González, J. Appl. Phys. 73, 5372 (1993).
16. I. Koiwa, M. Usuda, and T. Osaka, J. Electrochem. Soc. 135, 1222 (1988).
17. K. Aoki, O. Takano, Plat. Surf. Finish 73, 136 (1986).
18. A. Kohn et al., Mater. Sci. Eng., A 302, 18 (2001).
19. K. Ishida and T. Nishizawa, Bull. Alloy Phase Diagrams 11, 555 (1990).
20. Joint Committee on Powder Diffraction Standards, No. 33-1382.
21. T. H. De Keijser et al., J. Appl. Crystallogr. 16, 309 (1983).
22. A. Zern et al., J. Appl. Phys. 85, 7609 (1999).
23. U. Admon et al., J. Appl. Phys. 59, 2002 (1986).
24. Joint Committee on Powder Diffraction Standards, No. 05-0727.
25. Joint Committee on Powder Diffraction Standards, No. 15-0806.
26. Joint Committee on Powder Diffraction Standards, No. 32-0306.
27. K. I. Chopra, Thin Film Phenomena (McGraw-Hill, New York, 1969).
28. H. Kissinger, Anal. Chem. 29, 1702 (1957).
29. P. G. Boswell, J. Mater. 15, 1939 (1980).
30. J. Pelleg and L. Rubinovich, J. Vac. Sci. Technol. A 18, 2709 (2000).
31. F. Nava, T. Tien, and K. N. Tu, J. Appl. Phys. 57, 2018 (1985).
32. M. Avrami, J. Chem. Phys. 9, 177 (1941).
33. J. M. Riveiro and A. Hernando, Phys. Rev. B 32, 5102 (1985).
34. N. B. Goodman, L. Ley, and D. W. Bullet, Phys. Rev. B 27, 7440 (1983).
35. D. A. Shirley, Phys. Rev. B 5, 4709 (1972).
36. T. Nishizawa and K. Ishida, Bull. Alloy Phase Diagrams 5, 161 (1984).
37. S. V. Nagender Naidu, A. M. Sriramamurthy, and P. Rama Rao, Phase Diagrams of Binary Tungsten Alloys (Indian Institute of Metals, Calcutta, 1998), p. 60.
38. G. C. Chi and G. S. Cargill III, J. Appl. Phys. 50, 2713 (1979).
39. A. Van der Drift, Philips Res. Rep. 22, 267 (1967).
40. D. W. Henderson, J. Non-Cryst. Solids 30, 301 (1979).
41. H. S. Chen, Appl. Phys. Lett. 29, 12 (1976).
42. S. Ranganathan and M. von Heimendahl, J. Mater. 16, 2401 (1981).
43. Pearson's Handbook of Crystallographic Data for Intermetallic Phases, edited by P. Villars and L. D. Calvert, 2nd ed. (ASM Int., Materials Park, OH, 1991).
44. A. Brenner, Electrodeposition of Alloys (Academic, New York, 1963), Vol. 2.
45. R. Hultgren, P. D. Desai, D. T. Hawkins, M. Gleiser, K. K. Kelly, and D. D. Wagman, Selected Values of the Thermodynamic Properties of the Elements (American Society for Metals, Metals Park, OH, 1989).
46. B. Cabral, Jr. et al., J. Vac. Sci. Technol. A 11, 1435 (1993).
47. S. Nakahara and S. Mahajan, J. Electrochem. Soc. 127, 283 (1980).
48. P. G. Shewmon, Transformations in Metals (McGraw-Hill, New York, 1969).
49. A. Kohn et al., J. Appl. Phys. 94, 3015 (2003).