Photocatalytic TiO2 thin films synthesized by the post-discharge of an RF atmospheric plasma torch

Surface and Coatings Technology

Volumn 289, Issue , 2016, Pages 172-178

  Collette, Stéphanie ^a   Hubert, Julie ^a   Batan, Abdelkrim ^a   Baert, Kitty ^b   Raes, Marc ^b   Vandendael, Isabelle ^b   Daniel, Alain ^c   Archambeau, Catherine ^c   Terryn, Herman ^b   Reniers, François ^a  

^a UNIVERSITÉ LIBRE DE BRUXELLES   (Belgium)

^b VRIJE UNIVERSITEIT BRUSSEL   (Belgium)

^c Centre for Research in Metallurgy   (Belgium)

Author keywords

Atmospheric post discharge; Photocatalysis; Plasma deposition; Titanium dioxide

Indexed keywords

AMORPHOUS FILMS; COATINGS; ELECTRIC DISCHARGES; HYDROPHILICITY; OXIDE FILMS; PHOTOCATALYSIS; PLASMA DEPOSITION; PLASMA TORCHES; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES;

ANATASE STRUCTURES; ATMOSPHERIC PLASMA TORCH; EXCELLENT PHOTOCATALYTIC ACTIVITIES; LIQUID PRECURSORS; PHOTOCATALYTIC ACTIVITIES; POST-DISCHARGE; SUBSTRATE HEATING; TITANIUM TETRAISOPROPOXIDE;

THIN FILMS;

EID: 84960539755     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2016.01.049     Document Type: Article

References (64)

1. Carbone R., Marangi I., Zanardi A., Giorgetti L., Chierici E., Berlanda G., Podestà A., Fiorentini F., Bongiorno G., Piseri P., Pelicci P., Milani P. Biomaterials 2006, 27(17):3221.
2. Cui C., Liu H., Li Y., Sun J., Wang R., Liu S., Lindsay Greer A. Mater. Lett. 2005, 59(24-25):3144.
3. Han W., Wang Y.D., Zheng Y.F. Adv. Mater. Res. 2009, 79:389.
4. Will J., Zuegner S., Haugen H., Hopfner U., Aigner J., Wintermantel E. Key Eng. Mater. 2003, 254-256:937.
5. Hadjiivanov K.I., Klissurski D.G. Chem. Soc. Rev. 1996, 25(1):61.
6. Fujishima A., Honda K. Nature 1972, 238:37.
7. Ohko Y., Saitoh S., Tatsuma T., Fujisjima A. J. Electrochem. Soc. 2001, 148:B24.
8. Hajkova P., Spatenka P. Eur. Phys. J. D 2009, 54:189.
9. Matsunaga T., Tomoda R., Nakajima T., Wake H. FEMS Microbiol. Lett. 1985, 29(1-2):211.
10. Kumazawa N., Islam M.R., Takeuchi M. J. Electroanal. Chem. 1999, 472:137.
11. Fujishima A., Rao T.N., Tryk D.A. J. Photochem. Photobiol. C Photochem. 2000, 1:1.
12. Ibáñez J.A., Litter M.I., Pizarro R.A. J. Photochem. Photobiol. A Chem. 2003, 157(1):81.
13. Chang D.L., Li X., Zhao T., Yang J., Zhu A. Chem. Vap. Depos. 2012, 18:121.
14. Zhang C., Chaudhary U., Das S., Godavarty A., Agarwal A. J. Therm. Spray Technol. 2013, 22(7):1193.
15. Guan K. Surf. Coat. Technol. 2005, 191:155.
16. Fateh R., Dillert R., Bahnemann D. Langmuir 2013, 29:3730.
17. Simonsen M.E., Li Z., Sogaard E.G. Appl. Surf. Sci. 2009, 255:8054.
18. Ishida N., Fujita D. J. Vac. Sci. Technol. A 2012, (30).
19. Wang R., Hashimoto K., Fujishima A., Chikuni M., Kojima E., Kitamura A., Shimohigoshi M., Watanabe T. Nature 1997, 388(6641):431.
20. Takeuchi M., Sakamoto K., Martra G., Coluccias S., Anpo M. J. Phys. Chem. B 2005, 109(32).
21. Taylor D.J., Fleig P.F., Schwab S.T., Page R.A. Surf. Coat. Technol. 1999, 120-121:465.
22. Piszczek P., Richert M., Grodzicki A., Talik E., Heimann J. Chem. Vap. Depos. 2005, 11:399.
23. Pérez-Pacheco A., Prieto C., Castaneda-Guzman R., Garcia-Lopez J. Thin Solid Films 2009, 517:5415.
24. Bozorgtabar M., Rahimipour M., Salehi M., Jafarpour M. Surf. Coat. Technol. 2011, 205:S229.
25. Shaokui X., Jinzhou X., Xiaobo P., Jing Z. Plasma Sci. Technol. 2006, 8:292.
26. Nakamura M., Makino K., Sirghi L., Aoki T., Hatanaka Y. Surf. Coat. Technol. 2003, 169-170:699.
27. Nizard H., Kosinova M.L., Fainer N.I., Rumyantsev Yu.M., Ayupov B.M., Shubin Yu.V. Surf. Coat. Technol. 2008, 202:4076.
28. Lettmann C., Hildenbrand K., Kisch H., Macyk W., Maier W.F. Appl. Catal. B Environ. 2001, 32:215.
29. Bradley D.C. Chem. Rev. 1989, 89:1317.
30. Filatov E.S., Nizard H., Semyannikov P.P., Sysoev S.V., Trubin S.V., Morozova N.B., Zherikova K.V., Gelfondn N.V. ECS Trans. 2009, 25:557.
31. Klenko Y., Pichal J. Plasma Chem. Plasma Process. 2012, 32:1215.
32. Kment S., Kluson P., Zabova H., Churpita A., Chichina M., Cada M., Gregora I., Krysa J., Hubicka Z. Surf. Coat. Technol. 2009, 204:667.
33. Huang S.-C., Lin T., Lu S., Chou K. J. Mater. Sci. 1999, 34(17):4293.
34. Liu W.-J., Lai Y.-L. Surf. Coat. Technol. 2011, 206:959.
35. Nakamura M., Kato S., Aoki T., Sirghi L., Hatanaka Y. Thin Solid Films 2001, 401:138.
36. Ahn K.-H., Park Y.-B., Parl D.-W. Surf. Coat. Technol. 2003, 171:198.
37. Sakaguchi K., Shimakawa K., Hatanaka Y. Jpn. J. Appl. Phys. 2006, 45:4183.
38. Borras A., Cotrino J., Gonzalez-Felipe A.R. J. Electrochem. Soc. 2007, 154:P152.
39. Seo H.-K., Elliott C., Shin H.-S. Appl. Mater. Interfaces 2010, 2(12).
40. Jimenez C., De Barros D., Darraz A., Deschanvres J.-L., Rapenne L., Chaudouët P., Méndez J.E., Weiss F., Thomachot M., Sindzingre T., Berthomé G., Ferreret F.J. Surf. Coat. Technol. 2007, 201:8971.
41. Maurau R., Boscher N.D., Olivier S., Bulou S., Belmonte T., Dutroncy J., Sindzingre T., Choquet P. Surf. Coat. Technol. 2013, 232:159.
42. Fakhouri H., Ben Salem D., Carton O., Pulpytel J., Arefi-Khonsari F. J. Phys. D. Appl. Phys. 2014, 47:265301.
43. Lachheb H., Puzenat E., Houas A., Ksibi M., Elaloui E., Guillard C., Herrman J.-M. Appl. Catal. B Environ. 2002, 39(1):75.
44. Mathur S., Kuhn P. Surf. Coat. Technol. 2006, 201:807.
45. Wagner C.D., Riggs W.M., Davis L.E., Moulder J.F., Muilenberg G.E. Handbook of X-ray Photoelectron Spectroscopy 1979, Perkin-Elmer Corporation, USA.
46. Nakamura M., Korzec D., Aoki T., Engemann J., Hatanaka Y. Appl. Surf. Sci. 2001, 175-176:697.
47. Wu C.-Y., Chiang B.-S., Chang S., Liu D.-S. Appl. Surf. Sci. 2011, 257:1893.
48. Wang W., Wolden C.A. Thin Solid Films 2006, 515:1708.
49. Wright G.B., Mooradian A. Phys. Rev. Lett. 1967, 18:608.
50. Uchinokura K., Sekine T., Matsuura E. J. Phys. Chem. Solids 1974, 35:171.
51. Rossella F., Galinetto P., Mozzati M.C., Malavasi L., Diaz Fernandez Y., Drera G., Sangaletti L. J. Raman Spectrosc. 2010, 41:558.
52. Li Y.-L., Ishigaki T. J. Phys. Chem. B 2004, 108:15536.
53. Di L.-B., Li X.-S., Shi C., Xu Y., Zhao D.-Z., Zhu A.-M. J. Phys. D. Appl. Phys. 2009, 42:032001.
54. Cho D.L., Min H., Kim J.-H., Cha G.-S., Kim G.-S., Kim B.H., Ohk S.-H. J. Ind. Eng. Chem. 2007, 13(3):434.
55. Quéré D. Annu. Rev. Mater. Res. 2008, 38:71.
56. Chang H., Su C., Lo C., Chen L., Tsung T., Jwo C. Mater. Trans. 2004, 45(12):3334.
57. Gnaser H., Savina M., Calaway W., Tripa C., Veryovkin I., Pellin M. Int. J. Mass Spectrom. 2005, 245:61.
58. Imamura K., Ikeda E., Nagayasu T., Sakiyama T., Nakanishi K. J. Colloid Interface Sci. 2002, 245(1):50.
59. Almeida R.M., Vasconcelos H.C., Gonçalves M.C., Santos L.F. J. Non-Cryst. Solids 1998, 232-234:65.
60. Kim H.-J., Shul Y.-G., Han H. Top. Catal. 2005, 35(3-4):287.
61. Dachille F., Simons P.Y., Roy R. Am. Mineral. 1968, 53:1929.
62. Yuan S., Yu L., Shi L., Wu J., Fang J., Zhao Y. Catal. Commun. 2009, 10:1188.
63. Yuan R., Guan R., Shen W., Zheng J. J. Colloid Interface Sci. 2005, 282:87.
64. Qiu B., Xing M., Zhang J. J. Am. Chem. Soc. 2014, 136:5852.