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Volumn 206, Issue 5, 2011, Pages 959-962
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Investigation of novel low temperature atmospheric pressure plasma system for deposition photo-catalytic TiO2 thin film
a
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Author keywords
Atmospheric pressure plasma; Dielectric barrier discharge; Photo catalyst; Plasma jet; Titanium oxide
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Indexed keywords
ATMOSPHERIC PLASMAS;
ATMOSPHERIC PRESSURE PLASMAS;
CARRIER GAS;
DEPOSITION TECHNIQUE;
DIELECTRIC BARRIER DISCHARGES;
GRAZING-INCIDENCE X-RAY DIFFRACTION;
LOW TEMPERATURES;
MICROSTRUCTURE EVOLUTIONS;
PHOTO-CATALYTIC;
PLASMA METHODS;
PLASMA SYSTEMS;
PRECURSOR FLOW RATES;
SCANNING ELECTRON MICROSCOPES;
SUBSTRATE TEMPERATURE;
THIN-FILM DEPOSITIONS;
TIO;
TITANIUM DIOXIDE THIN FILM;
TITANIUM TETRAISOPROPOXIDE;
TRANSMISSION ELECTRON MICROSCOPE;
ULTRASONIC OSCILLATORS;
WORKING GAS;
ARGON;
ATMOSPHERIC PRESSURE;
ATMOSPHERIC TEMPERATURE;
ATMOSPHERICS;
CONTACT ANGLE;
DEPOSITION;
ELECTRIC DISCHARGES;
ELECTRON MICROSCOPES;
FLOW RATE;
OXIDES;
PHOTOELECTRON SPECTROSCOPY;
PLASMA DEPOSITION;
PLASMA DEVICES;
PLASMA SOURCES;
PLASMA THEORY;
SCANNING ELECTRON MICROSCOPY;
THIN FILMS;
TITANIUM;
TITANIUM DIOXIDE;
TRANSMISSION ELECTRON MICROSCOPY;
VAPOR DEPOSITION;
X RAY DIFFRACTION;
X RAY DIFFRACTION ANALYSIS;
X RAY PHOTOELECTRON SPECTROSCOPY;
PLASMA DIAGNOSTICS;
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EID: 80055121776
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2011.03.103 Document Type: Article |
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Times cited : (8)
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References (12)
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