Photoconductive characteristics of hydro-oxygenated amorphous titanium oxide films prepared by remote plasma-enhanced chemical vapor deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 5 A, 2006, Pages 4183-4186

  Sakaguchi, Koichi ^a   Shimakawa, Koichi ^b   Hatanaka, Yoshinori ^a  

^a AICHI UNIVERSITY OF TECHNOLOGY   (Japan)

^b GIFU UNIVERSITY   (Japan)

Author keywords

Amorphous titanium oxide films; Oxygen gas; Photoconductive characteristics; Stretched exponential function; UV illumination

Indexed keywords

AMORPHOUS MATERIALS; CHEMICAL VAPOR DEPOSITION; IRRADIATION; OXYGEN; PHOTOCONDUCTIVITY; PHOTOCURRENTS; PLASMAS; SENSORS; THIN FILMS; ULTRAVIOLET RADIATION;

AMORPHOUS TITANIUM OXIDE FILMS; OXYGEN GAS; PHOTOCONDUCTIVE CHARACTERISTICS; STRETCHED EXPONENTIAL FUNCTION; UV ILLUMINATION;

TITANIUM OXIDES;

EID: 33646867855     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.4183     Document Type: Article

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