TiOx films deposited by plasma enhanced chemical vapour deposition method in atmospheric dielectric barrier discharge plasma

Plasma Chemistry and Plasma Processing

Volumn 32, Issue 6, 2012, Pages 1215-1225

  Klenko, Y ^a   Pichal, J ^a  

^a CZECH TECHNICAL UNIVERSITY IN PRAGUE   (Czech Republic)

Author keywords

Atmospheric dielectric barrier discharge; Chemical composition; Plasma enhanced chemical vapour deposition; Thin film; TiOx; Titanium isopropoxide (TTIP)

Indexed keywords

ATMOSPHERIC DIELECTRIC BARRIER DISCHARGE; CHEMICAL COMPOSITIONS; PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITION; TIO; TITANIUM ISOPROPOXIDE;

ARGON; CARBON DIOXIDE; DEPOSITS; DIELECTRIC DEVICES; OXYGEN; PARTIAL DISCHARGES; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; VAPOR DEPOSITION; VAPORS; WETTING;

CARBON FILMS;

EID: 84870554609     PISSN: 02724324     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11090-012-9401-0     Document Type: Article

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