Deposition of titanium dioxide from TTIP by plasma enhanced and remote plasma enhanced chemical vapor deposition

Surface and Coatings Technology

Volumn 202, Issue 17, 2008, Pages 4076-4085

  Nizard, H ^a   Kosinova, M L ^b   Fainer, N I ^b   Rumyantsev, Yu M ^b   Ayupov, B M ^b   Shubin, Yu V ^b  

^a AIRBUS GROUP INNOVATIONS   (Germany)

^b NIKOLAEV INSTITUTE OF INORGANIC CHEMISTRY   (Russian Federation)

Author keywords

Anatase; Chemical vapour deposition; Remote plasma; Titanium dioxide

Indexed keywords

AMORPHOUS FILMS; CRYSTALLIZATION; HEAT TREATMENT; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; STOICHIOMETRY;

PHOTO-GENERATED HYDROPHILIC ACTIVITY; PLASMA ENHANCED REACTOR; REMOTE PLASMA ENHANCED REACTOR;

TITANIUM DIOXIDE;

AMORPHOUS FILMS; CRYSTALLIZATION; HEAT TREATMENT; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; STOICHIOMETRY; TITANIUM DIOXIDE;

EID: 43249095678     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.02.023     Document Type: Article

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