Deposition of thin titania films by dielectric barrier discharge at atmospheric pressure

Plasma Science and Technology

Volumn 8, Issue 3, 2006, Pages 292-296

  Xu, Shaokui ^a   Xu, Jinzhou ^a   Peng, Xiaobo ^a   Zhang, Jing ^a  

^a DONGHUA UNIVERSITY   (China)

Author keywords

Atmospheric pressure; Dielectric barrier discharge; Thin film deposition; Titania film

Indexed keywords

DEPOSITION RATE; DIELECTRIC BARRIER DISCHARGE; THIN FILM DEPOSITION; TITANIA FILMS;

ATMOSPHERIC PRESSURE; CRYSTALLIZATION; DEPOSITION; ELECTRIC DISCHARGES; SCANNING ELECTRON MICROSCOPY; TITANIUM DIOXIDE; X RAY DIFFRACTION;

THIN FILMS;

EID: 33749512841     PISSN: 10090630     EISSN: None     Source Type: Journal    
DOI: 10.1088/1009-0630/8/3/09     Document Type: Article

References (16)

1. Wauthoz P, Ruwet M, Machej T, et al, Appl. Catal. 1999 69 149
2. Regan B O, Gratzel M. Nature 1991 353 737
3. Birkefeld L D, Azad A M, Akbar S A. J. Am, Ceram. Soc. 1992 75 2964
4. Nagase K, Shimizu Y, Miura N, et al. J. Ceram. Soc. 1993 101 1032
5. Harizanov O, Harizanova A. Solar Energy Materials & Solar Cells 2000, 63 185-195
6. Badawy W A. J. Mater. Sci. 1997 32 4979
7. Tang H, Prasad K, Sanjines R, et al. J. Appl. Phys., 1994, 75 2042-2047
8. Cao Y A, Xie T F, Zhang X T. Acta Physico-chemica Sinica, 1999, 15: 680 (in Chinese)
9. Karches M, Morstein M, Philipp R R. Catalysis Today, 2002, 72 267-279
10. Foest R, Adler F, Sigeneger F, et al. Surf. Coatings Technol., 2003, 163-164: 323-330
11. Bugaev S P, Korotaev A D, Oskpomov K V, et al. Surf. Coatings Technol., 1997, 96: 123-128
12. Martin S, Massines F, Gherarardi, et al. Surf. Coatings Technol., 2004, 177-178: 693-698
13. Nikonov V, Bartnikas R, Wertheimer M R. IEEE Trans.Plasma Sci., 2001, 29: 866-874
14. Zhang Lide, Mou Jimei. Nano material and nano configuration, Beijing: Science Press, 2002, 147-148 (in Chinese)
15. Mohamed S H, Kappertz O, Niemeier T, et al. Thin Solid Films, 2004, 468: 48-56
16. Fan Q, McQuillin B, Ray A K, et al. J. Phys. D: Appl. Phys., 2000, 33: 2683-2686