Deposition of TiO 2 thin films by atmospheric plasma post-discharge assisted injection MOCVD

Surface and Coatings Technology

Volumn 201, Issue 22-23 SPEC. ISS., 2007, Pages 8971-8975

  Jimenez C ^a   De Barros, D ^a,b   Darraz, A ^a   Deschanvres, J L ^a   Rapenne, L ^a   Chaudouet P ^a   Mendez J E ^a   Weiss, F ^a   Thomachot, M ^b   Sindzingre, T ^b   Berthome G ^c   Ferrer, F J ^d  

^a MINATEC   (France)

^b AcXys Technologies   (France)

^c UNIV GRENOBLE ALPES   (France)

^d CENTRO NACIONAL DE ACELERADORES   (Spain)

Author keywords

Anatase; Atmospheric Plasma; Injection MOCVD; PECVD; Titanium oxide

Indexed keywords

ATMOSPHERIC PRESSURE (AP) PLASMA; ATMOSPHERIC PRESSURE DEPOSITION; PULSE INJECTION METALLORGANIC CHEMICAL VAPOUR DEPOSITION;

METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROSTRUCTURE; MORPHOLOGY; PLASMA DEPOSITION;

TITANIUM DIOXIDE;

METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROSTRUCTURE; MORPHOLOGY; PLASMA DEPOSITION; TITANIUM DIOXIDE;

EID: 34547782713     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.04.025     Document Type: Article

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