-
1
-
-
21644466786
-
-
A. Mills, G. Hill, M. Crow, S. Hodgen, J. Appl. Electrochem. 2005, 35, 641.
-
(2005)
J. Appl. Electrochem.
, vol.35
, pp. 641
-
-
Mills, A.1
Hill, G.2
Crow, M.3
Hodgen, S.4
-
4
-
-
0030854750
-
-
R. Wang, K. Hashimoto, A. Fujishima, M. Chikuni, E. Kojima, A. Kitamura, M. Shimohigoshi, T. Watanabe, Nature 1997, 388, 431.
-
(1997)
Nature
, vol.388
, pp. 431
-
-
Wang, R.1
Hashimoto, K.2
Fujishima, A.3
Chikuni, M.4
Kojima, E.5
Kitamura, A.6
Shimohigoshi, M.7
Watanabe, T.8
-
7
-
-
71749083995
-
-
S. Kment, P. Kluson, H. Zabova, A. Churpita, M. Chichina, M. Cada, I. Gregora, J. Krysa, Z. Hubicka, Surf. Coat. Technol. 2009, 204, 667.
-
(2009)
Surf. Coat. Technol.
, vol.204
, pp. 667
-
-
Kment, S.1
Kluson, P.2
Zabova, H.3
Churpita, A.4
Chichina, M.5
Cada, M.6
Gregora, I.7
Krysa, J.8
Hubicka, Z.9
-
8
-
-
63849299294
-
-
L. B. Di, X. S. Li, C. Shi, Y. Xu, D. Z. Zhao, A. M. Zhu, J. Phys. D: Appl. Phys. 2009, 42, 032001.
-
(2009)
J. Phys. D: Appl. Phys.
, vol.42
, pp. 032001
-
-
Di, L.B.1
Li, X.S.2
Shi, C.3
Xu, Y.4
Zhao, D.Z.5
Zhu, A.M.6
-
9
-
-
70450221077
-
-
J. L. Hodgkinson, H. M. Yates, D. W. Sheel, Plasma Process. Polym. 2009, 6, 575.
-
(2009)
Plasma Process. Polym.
, vol.6
, pp. 575
-
-
Hodgkinson, J.L.1
Yates, H.M.2
Sheel, D.W.3
-
10
-
-
77954944214
-
-
P. Hajkova, P. Spatenka, J. Krumeich, P. Exnar, A. Kolouch, J. Matousek, Plasma Process. Polym. 2009, 6, S735.
-
(2009)
Plasma Process. Polym.
, vol.6
-
-
Hajkova, P.1
Spatenka, P.2
Krumeich, J.3
Exnar, P.4
Kolouch, A.5
Matousek, J.6
-
11
-
-
34547544013
-
-
L. H. Nie, C. Shi, Y. Xu, O. H. Wu, A. M. Zhu, Plasma Process. Polym. 2007, 4, 574.
-
(2007)
Plasma Process. Polym.
, vol.4
, pp. 574
-
-
Nie, L.H.1
Shi, C.2
Xu, Y.3
Wu, O.H.4
Zhu, A.M.5
-
12
-
-
54949123457
-
-
A. M. Zhu, L. H. Nie, Q. H. Wu, X. L. Zhang, X. F. Yang, Y. Xu, C. Shi, Chem. Vap. Deposition 2007, 13, 141.
-
(2007)
Chem. Vap. Deposition
, vol.13
, pp. 141
-
-
Zhu, A.M.1
Nie, L.H.2
Wu, Q.H.3
Zhang, X.L.4
Yang, X.F.5
Xu, Y.6
Shi, C.7
-
13
-
-
33947616758
-
-
X. L. Zhang, L. H. Nie, Y. Xu, C. Shi, X. F. Yang, A. M. Zhu, J. Phys. D: Appl. Phys. 2007, 40, 1763.
-
(2007)
J. Phys. D: Appl. Phys.
, vol.40
, pp. 1763
-
-
Zhang, X.L.1
Nie, L.H.2
Xu, Y.3
Shi, C.4
Yang, X.F.5
Zhu, A.M.6
-
16
-
-
33746364787
-
-
A. M. Zhu, L. H. Nie, X. L. Zhang, C. Shi, Z. M. Song, Y. Xu, Plasma Sci. Technol. 2004, 6, 2546.
-
(2004)
Plasma Sci. Technol.
, vol.6
, pp. 2546
-
-
Zhu, A.M.1
Nie, L.H.2
Zhang, X.L.3
Shi, C.4
Song, Z.M.5
Xu, Y.6
-
17
-
-
0037247765
-
-
S. A. O'Neill, I. P. Parkin, R. Clark, A. Mills, N. Elliott, J. Mater. Chem. 2003, 13, 56.
-
(2003)
J. Mater. Chem.
, vol.13
, pp. 56
-
-
O'Neill, S.A.1
Parkin, I.P.2
Clark, R.3
Mills, A.4
Elliott, N.5
-
19
-
-
0000003834
-
-
H. K. Ha, M. Yoshimoto, H. Koinuma, B. K. Moon, H. Ishiwara, Appl. Phys. Lett. 1996, 68, 2965.
-
(1996)
Appl. Phys. Lett.
, vol.68
, pp. 2965
-
-
Ha, H.K.1
Yoshimoto, M.2
Koinuma, H.3
Moon, B.K.4
Ishiwara, H.5
-
20
-
-
79151475912
-
-
H. Seo, C. M. Elliott, H. Shin, ACS Appl. Mater. Interfaces 2010, 2, 3397.
-
(2010)
ACS Appl. Mater. Interfaces
, vol.2
, pp. 3397
-
-
Seo, H.1
Elliott, C.M.2
Shin, H.3
-
21
-
-
77949675472
-
-
X. D. Zhang, H. Zhang, C. C. Wei, J. Sun, G. F. Hou, S. Z. Xiong, X. H. Geng, Y. Zhao, Chinese Phys. B 2010, 19, 38101.
-
(2010)
Chinese Phys. B
, vol.19
, pp. 38101
-
-
Zhang, X.D.1
Zhang, H.2
Wei, C.C.3
Sun, J.4
Hou, G.F.5
Xiong, S.Z.6
Geng, X.H.7
Zhao, Y.8
-
22
-
-
33747390062
-
-
M. N. van den Donker, R. Schmitz, W. Appenzeller, B. Rech, W. Kessels, M. van de Sanden, Thin Solid Films 2006, 511, 562.
-
(2006)
Thin Solid Films
, vol.511
, pp. 562
-
-
Van Den Donker, M.N.1
Schmitz, R.2
Appenzeller, W.3
Rech, B.4
Kessels, W.5
Van De Sanden, M.6
-
23
-
-
84986773666
-
-
T. Ohsaka, F. Izumi, Y. Fujiki, J. Raman Spectrosc. 1978, 7, 321.
-
(1978)
J. Raman Spectrosc.
, vol.7
, pp. 321
-
-
Ohsaka, T.1
Izumi, F.2
Fujiki, Y.3
-
24
-
-
0031335078
-
-
P. Sawunyama, L. Jiang, A. Fujishima, K. Hashimoto, J. Phys. Chem. B 1997, 101, 11000.
-
(1997)
J. Phys. Chem. B
, vol.101
, pp. 11000
-
-
Sawunyama, P.1
Jiang, L.2
Fujishima, A.3
Hashimoto, K.4
-
25
-
-
79951941577
-
-
M. N. Ghazzal, N. Barthen, N. Chaoui, Appl. Catal. B-Environ. 2011, 103, 85.
-
(2011)
Appl. Catal. B-Environ.
, vol.103
, pp. 85
-
-
Ghazzal, M.N.1
Barthen, N.2
Chaoui, N.3
|