Atmospheric pressure, low temperature deposition of photocatalytic TiOx thin films with a blown arc discharge

Surface and Coatings Technology

Volumn 232, Issue , 2013, Pages 159-165

  Maurau, Rémy ^a   Boscher, Nicolas D ^a   Olivier, Sébastien ^a,b   Bulou, Simon ^a   Belmonte, Thierry ^b   Dutroncy, JérÔme ^c   Sindzingre, Thierry ^c   Choquet, Patrick ^a  

^a LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY   (Luxembourg)

^b INSTITUT JEAN LAMOUR   (France)

^c AcXys Technologies   (France)

Author keywords

Atmospheric pressure; Blown arc discharge; Growth mechanism; Photocatalytic activity; Thin film deposition; TiO2

Indexed keywords

ARC DISCHARGE; GROWTH MECHANISMS; PHOTOCATALYTIC ACTIVITIES; THIN-FILM DEPOSITIONS; TIO;

AGGLOMERATION; ATMOSPHERIC PRESSURE; COATINGS; CRYSTALLINE MATERIALS; PHOTOCATALYSIS; THIN FILMS; TITANIUM; TITANIUM DIOXIDE;

DEPOSITION;

EID: 84883461946     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2013.05.001     Document Type: Article

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