Atmospheric-pressure plasma CVD of TiO2 photocatalytic films using surface dielectric barrier discharge

Journal of Physics D: Applied Physics

Volumn 42, Issue 3, 2009, Pages

  Di, Lan Bo ^a   Li, Xiao Song ^a   Shi, Chuan ^a   Xu, Yong ^a   Zhao, De Zhi ^a   Zhu, Ai Min ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AIR STREAMS; ATMOSPHERIC-PRESSURE PLASMAS; COMPLETE OXIDATIONS; CONTINUOUS FLOW REACTORS; PHOTO-CATALYTIC OXIDATIONS; PHOTOCATALYTIC APPLICATIONS; PHOTOCATALYTIC FILMS; RAMAN ANALYSIS; SCANNING ELECTRON MICROSCOPES; SURFACE DIELECTRIC BARRIER DISCHARGES;

CALCINATION; CHEMICAL VAPOR DEPOSITION; DIELECTRIC DEVICES; DIELECTRIC MATERIALS; ELECTRIC DISCHARGES; FLOW CONTROL; OXIDATION; PHOTOCATALYSIS; PLASMAS; SCANNING ELECTRON MICROSCOPY;

AMORPHOUS FILMS;

EID: 63849299294     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/42/3/032001     Document Type: Article

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