Low-temperature atomic layer deposition of copper(II) oxide thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 34, Issue 1, 2016, Pages

  Iivonen, Tomi ^a   Hämäläinen, Jani ^a   Marchand, Benoît ^a   Mizohata, Kenichiro ^a   Mattinen, Miika ^a   Popov, Georgi ^a   Kim, Jiyeon ^b   Fischer, Roland A ^b   Leskelä, Markku ^a  

^a UNIVERSITY OF HELSINKI   (Finland)

^b RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ATOMIC LAYER DEPOSITION; COPPER OXIDES; FIELD EMISSION MICROSCOPES; SCANNING ELECTRON MICROSCOPY; TEMPERATURE; THIN FILMS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

CHARACTERIZATION OF THE FILMS; ELASTIC RECOIL DETECTION ANALYSIS; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; LOW TEMPERATURES; POLYCRYSTALLINE COPPER; TEMPERATURE WINDOW; UV-VIS SPECTROPHOTOMETRY; X RAY REFLECTIVITY;

OXIDE FILMS;

EID: 84944339706     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.4933089     Document Type: Article

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