Copper oxide thin films by chemical vapor deposition: Synthesis, characterization and electrical properties

Physica Status Solidi (A) Applications and Materials Science

Volumn 209, Issue 3, 2012, Pages 531-536

  Eisermann, Sebastian ^a   Kronenberger, Achim ^a   Laufer, Andreas ^a   Bieber, Johannes ^a   Haas, Gunther ^a   Lautenschläger, Stefan ^a   Homm, Gerd ^a   Klar, Peter J ^a   Meyer, Bruno K ^a  

^a JUSTUS LIEBIG UNIVERSITY   (Germany)

Author keywords

characterization; copper(II) acetylacetonate; Cu 2O; CVD; growth

Indexed keywords

ACCEPTOR LEVELS; BACKGROUND IMPURITIES; COPPER OXIDE THIN FILMS; MGO(1 0 0); POLYCRYSTALLINE FILM; RAMAN MEASUREMENTS; SILICON IMPURITY; X-RAY DIFFRACTION MEASUREMENTS;

CHARACTERIZATION; CHEMICAL VAPOR DEPOSITION; COPPER; GROWTH (MATERIALS); SAPPHIRE; THIN FILMS; X RAY DIFFRACTION;

ELECTRIC PROPERTIES;

EID: 84857740839     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.201127493     Document Type: Article

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